N doped ZnO (N:ZnO) film prepared by reactive HiPIMS deposition technique

In this paper, we report a nitrogen (N) doped zinc oxide (N:ZnO) film grown by the reactive high power impulse magnetron sputtering (HiPIMS) technique on glass substrates, where nitrogen gas (N2) is used as the N source. The proposal is to investigate the influence of process parameters on the alter...

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Veröffentlicht in:	AIP advances 2020-03, Vol.10 (3), p.035122-035122-13
Hauptverfasser:	Wang, Zhengduo, Li, Qian, Yuan, Yan, Yang, Lizhen, Zhang, Haibao, Liu, Zhongwei, Ouyang, Jiting, Chen, Qiang
Format:	Artikel
Sprache:	eng
Schlagworte:	Deposition Film growth Flow velocity Glass substrates Inductively coupled plasma Magnetron sputtering Nitrogen Optical emission spectroscopy Process parameters Temporal resolution Zinc oxide Zinc oxides
Online-Zugang:	Volltext
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