Composition, Structure, and Corrosion Electrochemical Properties of Copper–Manganese Alloy Subjected to Argon Ion Implantation

—The chemical composition and structure of thin surface layers of the Cu 80 Mn 20 alloy before and after argon-ion irradiation in a pulse-periodic mode have been studied using X-ray electron spectroscopy and X-ray diffraction. It has been shown that the ion-beam action leads to the substantial redis...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Physics of metals and metallography 2020, Vol.121 (1), p.46-52
Hauptverfasser:	Bakieva, O. R., Averkiev, I. K., Gil’mutdinov, F. Z., Kolotov, A. A., Borisova, E. M., Reshetnikov, S. M
Format:	Artikel
Sprache:	eng
Schlagworte:	Analysis Argon Argon ions Chemical composition Chemical properties Chemistry and Materials Science Copper base alloys Corrosion and anti-corrosives Diffraction Diffusion Electric properties Electrochemical analysis Electron spectroscopy Ion beams Ion implantation Ion irradiation Lattice parameters Manganese Manganese alloys Materials Science Metallic Materials Phase Transformations Solid solutions Specialty metals industry Spectrum analysis Structure Surface layers Thin films X-rays
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!