Nanoscale Block Copolymer Self‐Assembly and Microscale Polymer Film Dewetting: Progress in Understanding the Role of Interfacial Energies in the Formation of Hierarchical Nanostructures

Block copolymer (BCP) self‐assembly (SA) can be exploited for next‐generation lithography for the advanced nanopatterning of surfaces with versatile nanoscale features. To render BCP‐SA suitable for the creation of tailored surface patterns, a fundamental understanding of interfacial interactions is...

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Veröffentlicht in:	Advanced materials interfaces 2020-03, Vol.7 (5), p.n/a
Hauptverfasser:	Brassat, Katharina, Lindner, Jörg K. N.
Format:	Artikel
Sprache:	eng
Schlagworte:	Assembly Block copolymers dewetting Drying Film thickness hierarchical nanostructures interfacial energies Island creation Morphology Nanostructure Polymer films Polymers self‐assembly Separation
Online-Zugang:	Volltext
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