Closed-Loop, Axial Temperature Control of Etched Silicon Microcolumn for Tunable Thermal Gradient Gas Chromatography
Combining the resolution of conventional gas chromatography systems with the size factor of microGC systems is important for improving the affordability and portability of high performance gas analysis. Recent work has demonstrated the feasibility of high resolution separation of gases in a benchtop...
Gespeichert in:
| Veröffentlicht in: | Journal of microelectromechanical systems 2020-02, Vol.29 (1), p.76-85 |
|---|---|
| Hauptverfasser: | , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 85 |
|---|---|
| container_issue | 1 |
| container_start_page | 76 |
| container_title | Journal of microelectromechanical systems |
| container_volume | 29 |
| creator | Schnepf, Parker D. Davis, Aaron Iverson, Brian D. Vanfleet, Richard Davis, Robert C. Jensen, Brian D. |
| description | Combining the resolution of conventional gas chromatography systems with the size factor of microGC systems is important for improving the affordability and portability of high performance gas analysis. Recent work has demonstrated the feasibility of high resolution separation of gases in a benchtopscale short column system by controlling thermal gradients through the column. This work reports a microfabricated thermally controllable gas chromatographic column with a small footprint (approximately 6.25 cm 2 ). The design of the 20 cm column utilizes 21 individually controllable thin film heaters and conduction cooling to produce a desired temperature profile. The reported device is capable of heating and cooling rates exceeding 8000 °C/min and can reach temperatures of 350 °C. The control methods allow for excellent disturbance rejection and precision to within +/- 1 °C. Each length of the column between heaters was demonstrated to be individually controllable and displayed quadratic temperature profiles. This paper focuses on the fabrication process and implementation of the thermal control strategy. |
| doi_str_mv | 10.1109/JMEMS.2019.2953152 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_proquest_journals_2352207088</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>8926461</ieee_id><sourcerecordid>2352207088</sourcerecordid><originalsourceid>FETCH-LOGICAL-c246t-facdcfd5e260731e59b7a78dea301482c92999110e6212ca7fb707427b269cb63</originalsourceid><addsrcrecordid>eNo9kM1OwzAQhCMEEqXwAnCxxJUUe_Pj-FhFpYBacWg4W46zIamSODiJRN8el1acdg8zszuf590zumCMiuf37Wq7WwBlYgEiClgEF96MiZD5lEXJpdtpxH3OIn7t3QzDnlIWhkk888a0MQMW_saY_oksf2rVkAzbHq0aJ4skNd1oTUNMSVajrrAgu7qptenIttbWaNNMbUdKY0k2dSpvkGQV2talrK0qauxGslYDSStrWjWaL6v66nDrXZWqGfDuPOfe58sqS1_9zcf6LV1ufA1hPPql0oUuiwghpjxgGImcK54UqAL3fgJagBDC9ccYGGjFy5xTHgLPIRY6j4O593jK7a35nnAY5d5MtnMnJQQRAOU0SZwKTirXZxgslrK3davsQTIqj3TlH115pCvPdJ3p4WSqEfHfkAiIw5gFvyIadtY</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2352207088</pqid></control><display><type>article</type><title>Closed-Loop, Axial Temperature Control of Etched Silicon Microcolumn for Tunable Thermal Gradient Gas Chromatography</title><source>IEEE Electronic Library (IEL)</source><creator>Schnepf, Parker D. ; Davis, Aaron ; Iverson, Brian D. ; Vanfleet, Richard ; Davis, Robert C. ; Jensen, Brian D.</creator><creatorcontrib>Schnepf, Parker D. ; Davis, Aaron ; Iverson, Brian D. ; Vanfleet, Richard ; Davis, Robert C. ; Jensen, Brian D.</creatorcontrib><description>Combining the resolution of conventional gas chromatography systems with the size factor of microGC systems is important for improving the affordability and portability of high performance gas analysis. Recent work has demonstrated the feasibility of high resolution separation of gases in a benchtopscale short column system by controlling thermal gradients through the column. This work reports a microfabricated thermally controllable gas chromatographic column with a small footprint (approximately 6.25 cm 2 ). The design of the 20 cm column utilizes 21 individually controllable thin film heaters and conduction cooling to produce a desired temperature profile. The reported device is capable of heating and cooling rates exceeding 8000 °C/min and can reach temperatures of 350 °C. The control methods allow for excellent disturbance rejection and precision to within +/- 1 °C. Each length of the column between heaters was demonstrated to be individually controllable and displayed quadratic temperature profiles. This paper focuses on the fabrication process and implementation of the thermal control strategy.</description><identifier>ISSN: 1057-7157</identifier><identifier>EISSN: 1941-0158</identifier><identifier>DOI: 10.1109/JMEMS.2019.2953152</identifier><identifier>CODEN: JMIYET</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Chromatography ; Conduction cooling ; Conduction heating ; Control methods ; Cooling ; Cooling rate ; Fabrication ; Gas analysis ; Gas chromatography ; Gases ; Heating systems ; MEMS ; microcolumn ; Nickel ; Silicon ; silicon DRIE ; Stability ; Temperature ; Temperature control ; Temperature gradients ; Temperature profiles ; Thermal analysis ; thermal gradient ; Thin films</subject><ispartof>Journal of microelectromechanical systems, 2020-02, Vol.29 (1), p.76-85</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2020</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c246t-facdcfd5e260731e59b7a78dea301482c92999110e6212ca7fb707427b269cb63</cites><orcidid>0000-0002-4592-3728 ; 0000-0002-9124-0303 ; 0000-0002-2468-1600 ; 0000-0002-6165-4396 ; 0000-0002-2326-0214</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/8926461$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/8926461$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Schnepf, Parker D.</creatorcontrib><creatorcontrib>Davis, Aaron</creatorcontrib><creatorcontrib>Iverson, Brian D.</creatorcontrib><creatorcontrib>Vanfleet, Richard</creatorcontrib><creatorcontrib>Davis, Robert C.</creatorcontrib><creatorcontrib>Jensen, Brian D.</creatorcontrib><title>Closed-Loop, Axial Temperature Control of Etched Silicon Microcolumn for Tunable Thermal Gradient Gas Chromatography</title><title>Journal of microelectromechanical systems</title><addtitle>JMEMS</addtitle><description>Combining the resolution of conventional gas chromatography systems with the size factor of microGC systems is important for improving the affordability and portability of high performance gas analysis. Recent work has demonstrated the feasibility of high resolution separation of gases in a benchtopscale short column system by controlling thermal gradients through the column. This work reports a microfabricated thermally controllable gas chromatographic column with a small footprint (approximately 6.25 cm 2 ). The design of the 20 cm column utilizes 21 individually controllable thin film heaters and conduction cooling to produce a desired temperature profile. The reported device is capable of heating and cooling rates exceeding 8000 °C/min and can reach temperatures of 350 °C. The control methods allow for excellent disturbance rejection and precision to within +/- 1 °C. Each length of the column between heaters was demonstrated to be individually controllable and displayed quadratic temperature profiles. This paper focuses on the fabrication process and implementation of the thermal control strategy.</description><subject>Chromatography</subject><subject>Conduction cooling</subject><subject>Conduction heating</subject><subject>Control methods</subject><subject>Cooling</subject><subject>Cooling rate</subject><subject>Fabrication</subject><subject>Gas analysis</subject><subject>Gas chromatography</subject><subject>Gases</subject><subject>Heating systems</subject><subject>MEMS</subject><subject>microcolumn</subject><subject>Nickel</subject><subject>Silicon</subject><subject>silicon DRIE</subject><subject>Stability</subject><subject>Temperature</subject><subject>Temperature control</subject><subject>Temperature gradients</subject><subject>Temperature profiles</subject><subject>Thermal analysis</subject><subject>thermal gradient</subject><subject>Thin films</subject><issn>1057-7157</issn><issn>1941-0158</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNo9kM1OwzAQhCMEEqXwAnCxxJUUe_Pj-FhFpYBacWg4W46zIamSODiJRN8el1acdg8zszuf590zumCMiuf37Wq7WwBlYgEiClgEF96MiZD5lEXJpdtpxH3OIn7t3QzDnlIWhkk888a0MQMW_saY_oksf2rVkAzbHq0aJ4skNd1oTUNMSVajrrAgu7qptenIttbWaNNMbUdKY0k2dSpvkGQV2talrK0qauxGslYDSStrWjWaL6v66nDrXZWqGfDuPOfe58sqS1_9zcf6LV1ufA1hPPql0oUuiwghpjxgGImcK54UqAL3fgJagBDC9ccYGGjFy5xTHgLPIRY6j4O593jK7a35nnAY5d5MtnMnJQQRAOU0SZwKTirXZxgslrK3davsQTIqj3TlH115pCvPdJ3p4WSqEfHfkAiIw5gFvyIadtY</recordid><startdate>20200201</startdate><enddate>20200201</enddate><creator>Schnepf, Parker D.</creator><creator>Davis, Aaron</creator><creator>Iverson, Brian D.</creator><creator>Vanfleet, Richard</creator><creator>Davis, Robert C.</creator><creator>Jensen, Brian D.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7TB</scope><scope>7U5</scope><scope>8FD</scope><scope>FR3</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0002-4592-3728</orcidid><orcidid>https://orcid.org/0000-0002-9124-0303</orcidid><orcidid>https://orcid.org/0000-0002-2468-1600</orcidid><orcidid>https://orcid.org/0000-0002-6165-4396</orcidid><orcidid>https://orcid.org/0000-0002-2326-0214</orcidid></search><sort><creationdate>20200201</creationdate><title>Closed-Loop, Axial Temperature Control of Etched Silicon Microcolumn for Tunable Thermal Gradient Gas Chromatography</title><author>Schnepf, Parker D. ; Davis, Aaron ; Iverson, Brian D. ; Vanfleet, Richard ; Davis, Robert C. ; Jensen, Brian D.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c246t-facdcfd5e260731e59b7a78dea301482c92999110e6212ca7fb707427b269cb63</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Chromatography</topic><topic>Conduction cooling</topic><topic>Conduction heating</topic><topic>Control methods</topic><topic>Cooling</topic><topic>Cooling rate</topic><topic>Fabrication</topic><topic>Gas analysis</topic><topic>Gas chromatography</topic><topic>Gases</topic><topic>Heating systems</topic><topic>MEMS</topic><topic>microcolumn</topic><topic>Nickel</topic><topic>Silicon</topic><topic>silicon DRIE</topic><topic>Stability</topic><topic>Temperature</topic><topic>Temperature control</topic><topic>Temperature gradients</topic><topic>Temperature profiles</topic><topic>Thermal analysis</topic><topic>thermal gradient</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Schnepf, Parker D.</creatorcontrib><creatorcontrib>Davis, Aaron</creatorcontrib><creatorcontrib>Iverson, Brian D.</creatorcontrib><creatorcontrib>Vanfleet, Richard</creatorcontrib><creatorcontrib>Davis, Robert C.</creatorcontrib><creatorcontrib>Jensen, Brian D.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of microelectromechanical systems</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Schnepf, Parker D.</au><au>Davis, Aaron</au><au>Iverson, Brian D.</au><au>Vanfleet, Richard</au><au>Davis, Robert C.</au><au>Jensen, Brian D.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Closed-Loop, Axial Temperature Control of Etched Silicon Microcolumn for Tunable Thermal Gradient Gas Chromatography</atitle><jtitle>Journal of microelectromechanical systems</jtitle><stitle>JMEMS</stitle><date>2020-02-01</date><risdate>2020</risdate><volume>29</volume><issue>1</issue><spage>76</spage><epage>85</epage><pages>76-85</pages><issn>1057-7157</issn><eissn>1941-0158</eissn><coden>JMIYET</coden><abstract>Combining the resolution of conventional gas chromatography systems with the size factor of microGC systems is important for improving the affordability and portability of high performance gas analysis. Recent work has demonstrated the feasibility of high resolution separation of gases in a benchtopscale short column system by controlling thermal gradients through the column. This work reports a microfabricated thermally controllable gas chromatographic column with a small footprint (approximately 6.25 cm 2 ). The design of the 20 cm column utilizes 21 individually controllable thin film heaters and conduction cooling to produce a desired temperature profile. The reported device is capable of heating and cooling rates exceeding 8000 °C/min and can reach temperatures of 350 °C. The control methods allow for excellent disturbance rejection and precision to within +/- 1 °C. Each length of the column between heaters was demonstrated to be individually controllable and displayed quadratic temperature profiles. This paper focuses on the fabrication process and implementation of the thermal control strategy.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/JMEMS.2019.2953152</doi><tpages>10</tpages><orcidid>https://orcid.org/0000-0002-4592-3728</orcidid><orcidid>https://orcid.org/0000-0002-9124-0303</orcidid><orcidid>https://orcid.org/0000-0002-2468-1600</orcidid><orcidid>https://orcid.org/0000-0002-6165-4396</orcidid><orcidid>https://orcid.org/0000-0002-2326-0214</orcidid></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | ISSN: 1057-7157 |
| ispartof | Journal of microelectromechanical systems, 2020-02, Vol.29 (1), p.76-85 |
| issn | 1057-7157 1941-0158 |
| language | eng |
| recordid | cdi_proquest_journals_2352207088 |
| source | IEEE Electronic Library (IEL) |
| subjects | Chromatography Conduction cooling Conduction heating Control methods Cooling Cooling rate Fabrication Gas analysis Gas chromatography Gases Heating systems MEMS microcolumn Nickel Silicon silicon DRIE Stability Temperature Temperature control Temperature gradients Temperature profiles Thermal analysis thermal gradient Thin films |
| title | Closed-Loop, Axial Temperature Control of Etched Silicon Microcolumn for Tunable Thermal Gradient Gas Chromatography |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T12%3A46%3A27IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Closed-Loop,%20Axial%20Temperature%20Control%20of%20Etched%20Silicon%20Microcolumn%20for%20Tunable%20Thermal%20Gradient%20Gas%20Chromatography&rft.jtitle=Journal%20of%20microelectromechanical%20systems&rft.au=Schnepf,%20Parker%20D.&rft.date=2020-02-01&rft.volume=29&rft.issue=1&rft.spage=76&rft.epage=85&rft.pages=76-85&rft.issn=1057-7157&rft.eissn=1941-0158&rft.coden=JMIYET&rft_id=info:doi/10.1109/JMEMS.2019.2953152&rft_dat=%3Cproquest_RIE%3E2352207088%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2352207088&rft_id=info:pmid/&rft_ieee_id=8926461&rfr_iscdi=true |