Improved solubility of banana starch by dielectric barrier discharge plasma treatment
Summary A novel technology for banana starch modification has been developed using dielectric barrier discharge (DBD) plasma, and the effect of DBD plasma treatment on the solubility and pasting behaviours of banana starch were evaluated. The solubility of treated starch significantly increased from...
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Veröffentlicht in: | International journal of food science & technology 2020-02, Vol.55 (2), p.641-648 |
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creator | Yan, Si‐Liang Chen, Gui‐Yun Hou, Ya‐Jie Chen, Ye |
description | Summary
A novel technology for banana starch modification has been developed using dielectric barrier discharge (DBD) plasma, and the effect of DBD plasma treatment on the solubility and pasting behaviours of banana starch were evaluated. The solubility of treated starch significantly increased from 1.35 to 15.05 g 100 g−1 at 55 °C as the treatment intensity increased. Rapid viscosity analyser examination showed a dramatic change in the pasting behaviours of modified starch, and the peak viscosity decreased from 5242.0 to 153.0 (cP) as the treatment intensity increased. Evidence of nonpenetrative damage caused by plasma etching was shown by scanning electron microscope micrographs. The results of X‐ray diffraction and Fourier‐transform infrared spectroscopy analyses indicated that the DBD treatment changed the granular structure of banana starch.
Effect of DBD plasma on banana starch. |
doi_str_mv | 10.1111/ijfs.14318 |
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A novel technology for banana starch modification has been developed using dielectric barrier discharge (DBD) plasma, and the effect of DBD plasma treatment on the solubility and pasting behaviours of banana starch were evaluated. The solubility of treated starch significantly increased from 1.35 to 15.05 g 100 g−1 at 55 °C as the treatment intensity increased. Rapid viscosity analyser examination showed a dramatic change in the pasting behaviours of modified starch, and the peak viscosity decreased from 5242.0 to 153.0 (cP) as the treatment intensity increased. Evidence of nonpenetrative damage caused by plasma etching was shown by scanning electron microscope micrographs. The results of X‐ray diffraction and Fourier‐transform infrared spectroscopy analyses indicated that the DBD treatment changed the granular structure of banana starch.
Effect of DBD plasma on banana starch.</description><identifier>ISSN: 0950-5423</identifier><identifier>EISSN: 1365-2621</identifier><identifier>DOI: 10.1111/ijfs.14318</identifier><language>eng</language><publisher>Oxford: Wiley Subscription Services, Inc</publisher><subject>Banana starch ; cold plasma ; Dielectric barrier discharge ; Etching ; Infrared analysis ; Infrared spectroscopy ; Micrography ; Photomicrographs ; Plasma etching ; Scanning electron microscopy ; Solubility ; Starch ; starch modification ; starch solubility ; Viscosity</subject><ispartof>International journal of food science & technology, 2020-02, Vol.55 (2), p.641-648</ispartof><rights>2019 Institute of Food Science and Technology</rights><rights>International Journal of Food Science and Technology © 2020 Institute of Food Science and Technology</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3018-26b0f340018ab3cfbdc24d5902644e9f14051dfa00cc33f2a02708f7b3dfaf073</citedby><cites>FETCH-LOGICAL-c3018-26b0f340018ab3cfbdc24d5902644e9f14051dfa00cc33f2a02708f7b3dfaf073</cites><orcidid>0000-0002-9812-4727</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1111%2Fijfs.14318$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1111%2Fijfs.14318$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1417,27924,27925,45574,45575</link.rule.ids></links><search><creatorcontrib>Yan, Si‐Liang</creatorcontrib><creatorcontrib>Chen, Gui‐Yun</creatorcontrib><creatorcontrib>Hou, Ya‐Jie</creatorcontrib><creatorcontrib>Chen, Ye</creatorcontrib><title>Improved solubility of banana starch by dielectric barrier discharge plasma treatment</title><title>International journal of food science & technology</title><description>Summary
A novel technology for banana starch modification has been developed using dielectric barrier discharge (DBD) plasma, and the effect of DBD plasma treatment on the solubility and pasting behaviours of banana starch were evaluated. The solubility of treated starch significantly increased from 1.35 to 15.05 g 100 g−1 at 55 °C as the treatment intensity increased. Rapid viscosity analyser examination showed a dramatic change in the pasting behaviours of modified starch, and the peak viscosity decreased from 5242.0 to 153.0 (cP) as the treatment intensity increased. Evidence of nonpenetrative damage caused by plasma etching was shown by scanning electron microscope micrographs. The results of X‐ray diffraction and Fourier‐transform infrared spectroscopy analyses indicated that the DBD treatment changed the granular structure of banana starch.
Effect of DBD plasma on banana starch.</description><subject>Banana starch</subject><subject>cold plasma</subject><subject>Dielectric barrier discharge</subject><subject>Etching</subject><subject>Infrared analysis</subject><subject>Infrared spectroscopy</subject><subject>Micrography</subject><subject>Photomicrographs</subject><subject>Plasma etching</subject><subject>Scanning electron microscopy</subject><subject>Solubility</subject><subject>Starch</subject><subject>starch modification</subject><subject>starch solubility</subject><subject>Viscosity</subject><issn>0950-5423</issn><issn>1365-2621</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNp9kMFOwzAMhiMEEmNw4QkicUPqcOK03Y5oYmNoEgfYOUrThGVq15FkoL49GeWMc3D0-7MT_4TcMpiwFA9uZ8OECWTTMzJiWOQZLzg7JyOY5ZDlguMluQphBwAcSzEim1V78N2XqWnommPlGhd72llaqX06NETl9ZZWPa2daYyO3ulU894Zn6Sgt8p_GHpoVGgVjd6o2Jp9vCYXVjXB3PzlMdksnt7nz9n6dbmaP64zjcCm6W8VWBSQ7qpCbatac1HnM-CFEGZmmYCc1VYBaI1ouQJewtSWFSbRQoljcjfMTTt8Hk2Ictcd_T49KTmKnLNCICbqfqC070LwxsqDd63yvWQgT7bJk23y17YEswH-do3p_yHl6mXxNvT8AETLcDw</recordid><startdate>202002</startdate><enddate>202002</enddate><creator>Yan, Si‐Liang</creator><creator>Chen, Gui‐Yun</creator><creator>Hou, Ya‐Jie</creator><creator>Chen, Ye</creator><general>Wiley Subscription Services, Inc</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7QF</scope><scope>7QO</scope><scope>7QQ</scope><scope>7QR</scope><scope>7SC</scope><scope>7SE</scope><scope>7SP</scope><scope>7SR</scope><scope>7ST</scope><scope>7T7</scope><scope>7TA</scope><scope>7TB</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>C1K</scope><scope>F28</scope><scope>FR3</scope><scope>H8D</scope><scope>H8G</scope><scope>JG9</scope><scope>JQ2</scope><scope>KR7</scope><scope>L7M</scope><scope>L~C</scope><scope>L~D</scope><scope>P64</scope><scope>SOI</scope><orcidid>https://orcid.org/0000-0002-9812-4727</orcidid></search><sort><creationdate>202002</creationdate><title>Improved solubility of banana starch by dielectric barrier discharge plasma treatment</title><author>Yan, Si‐Liang ; Chen, Gui‐Yun ; Hou, Ya‐Jie ; Chen, Ye</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3018-26b0f340018ab3cfbdc24d5902644e9f14051dfa00cc33f2a02708f7b3dfaf073</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Banana starch</topic><topic>cold plasma</topic><topic>Dielectric barrier discharge</topic><topic>Etching</topic><topic>Infrared analysis</topic><topic>Infrared spectroscopy</topic><topic>Micrography</topic><topic>Photomicrographs</topic><topic>Plasma etching</topic><topic>Scanning electron microscopy</topic><topic>Solubility</topic><topic>Starch</topic><topic>starch modification</topic><topic>starch solubility</topic><topic>Viscosity</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yan, Si‐Liang</creatorcontrib><creatorcontrib>Chen, Gui‐Yun</creatorcontrib><creatorcontrib>Hou, Ya‐Jie</creatorcontrib><creatorcontrib>Chen, Ye</creatorcontrib><collection>CrossRef</collection><collection>Aluminium Industry Abstracts</collection><collection>Biotechnology Research Abstracts</collection><collection>Ceramic Abstracts</collection><collection>Chemoreception Abstracts</collection><collection>Computer and Information Systems Abstracts</collection><collection>Corrosion Abstracts</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Environment Abstracts</collection><collection>Industrial and Applied Microbiology Abstracts (Microbiology A)</collection><collection>Materials Business File</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Environmental Sciences and Pollution Management</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>Aerospace Database</collection><collection>Copper Technical Reference Library</collection><collection>Materials Research Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Civil Engineering Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Computer and Information Systems Abstracts Academic</collection><collection>Computer and Information Systems Abstracts Professional</collection><collection>Biotechnology and BioEngineering Abstracts</collection><collection>Environment Abstracts</collection><jtitle>International journal of food science & technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yan, Si‐Liang</au><au>Chen, Gui‐Yun</au><au>Hou, Ya‐Jie</au><au>Chen, Ye</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Improved solubility of banana starch by dielectric barrier discharge plasma treatment</atitle><jtitle>International journal of food science & technology</jtitle><date>2020-02</date><risdate>2020</risdate><volume>55</volume><issue>2</issue><spage>641</spage><epage>648</epage><pages>641-648</pages><issn>0950-5423</issn><eissn>1365-2621</eissn><abstract>Summary
A novel technology for banana starch modification has been developed using dielectric barrier discharge (DBD) plasma, and the effect of DBD plasma treatment on the solubility and pasting behaviours of banana starch were evaluated. The solubility of treated starch significantly increased from 1.35 to 15.05 g 100 g−1 at 55 °C as the treatment intensity increased. Rapid viscosity analyser examination showed a dramatic change in the pasting behaviours of modified starch, and the peak viscosity decreased from 5242.0 to 153.0 (cP) as the treatment intensity increased. Evidence of nonpenetrative damage caused by plasma etching was shown by scanning electron microscope micrographs. The results of X‐ray diffraction and Fourier‐transform infrared spectroscopy analyses indicated that the DBD treatment changed the granular structure of banana starch.
Effect of DBD plasma on banana starch.</abstract><cop>Oxford</cop><pub>Wiley Subscription Services, Inc</pub><doi>10.1111/ijfs.14318</doi><tpages>8</tpages><orcidid>https://orcid.org/0000-0002-9812-4727</orcidid></addata></record> |
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source | Wiley-Blackwell Journals; OUP_牛津大学出版社OA刊 |
subjects | Banana starch cold plasma Dielectric barrier discharge Etching Infrared analysis Infrared spectroscopy Micrography Photomicrographs Plasma etching Scanning electron microscopy Solubility Starch starch modification starch solubility Viscosity |
title | Improved solubility of banana starch by dielectric barrier discharge plasma treatment |
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