Effects of anodic layer thickness on overall performance of all-solid-state electrochromic device

In the present study, the effects of the anodic electrochromic layer employed in the all-solid-state ECD in the structure of ITO/NiO/Ta2O5/WO3/ITO/glass on the optical and electrochromic performances of the device are investigated. For this purposes, the nickel oxide films with various thicknesses w...

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Veröffentlicht in:	Solid state ionics 2019-11, Vol.341, p.115045, Article 115045
Hauptverfasser:	Atak, Gamze, Coşkun, Özlem Duyar
Format:	Artikel
Sprache:	eng
Schlagworte:	All-solid-state electrochromic device Bleaching Coloration efficiency Coloring Configurations Diffraction Diffraction patterns Electrochromic cells Electrochromism Film thickness Glass substrates Indium tin oxides Magnetron sputtering Modulation Nickel oxides NiO film Optical modulation Optical properties Oxide coatings Room temperature Solid state Solid state physics Tantalum Tantalum oxides Thin films Tungsten oxides
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