Periodic surface texturing of amorphous-Si thin film irradiated by UV nanosecond laser

A Nd:YAG (λ = 355 nm) nanosecond laser is used to anneal a 45-nm-thick amorphous-Si (a-Si) thin film on a glass substrate. Via scanning with a laser beam having a Gaussian shape at a repetition rate of 14 kHz, the surface of the a-Si film is crystallized, and laser-induced periodic surface structure...

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Veröffentlicht in:	Optical materials express 2019-11, Vol.9 (11), p.4247
Hauptverfasser:	Kang, Min Jin, Park, Tae Sang, Kim, Minyeong, Hwang, Eui Sun, Kim, Seung Hwan, Shin, Sung Tae, Cheong, Byoung-Ho
Format:	Artikel
Sprache:	eng
Schlagworte:	Atomic beam spectroscopy Atomic force microscopy Crystallization Fluence Free energy Gaussian beams (optics) Glass substrates Heat of formation Laser beams Laser processing Lasers Neodymium lasers Periodic variations Photovoltaic cells Raman spectroscopy Ripples Silicon films Surface layers Surface roughness Texturing Thin films YAG lasers
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