The Photopolymer Science and Technology Award
The Photopolymer Science and Technology Award No. 191100, the Outstanding Achievement Award 2019 was presented to Dr. Allen, Robert D. (IBM Research, Almaden) for his outstanding achievements in photopolymer science and technology, “Pioneering semiconductor patterning technology using water immersio...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2019/06/24, Vol.32(1), pp.3-5 |
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| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 32 |
| creator | Allen, Robert D. |
| description | The Photopolymer Science and Technology Award No. 191100, the Outstanding Achievement Award 2019 was presented to Dr. Allen, Robert D. (IBM Research, Almaden) for his outstanding achievements in photopolymer science and technology, “Pioneering semiconductor patterning technology using water immersion ArF lithography with the originally designed photoresist”. |
| doi_str_mv | 10.2494/photopolymer.32.3 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2315111800</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2315111800</sourcerecordid><originalsourceid>FETCH-LOGICAL-c479t-ad98f2a3010153147c39441ba7b43fcb6acc426fdb04d242ada5d5771da66f733</originalsourceid><addsrcrecordid>eNplkF9LwzAUxYMoOKcfwLeCz525ubft8jjmXxgoOJ9DmqTrRtfUpEP27d2cjIFP9-Hc3zmcw9gt8JEgSfdd7Xvf-Wa7dmGEYoRnbABIMs0R83M24BIolYLokl3FuOIcMcvkgKXz2iXvJ3DyYZauNS7RrU3mztStb_xim0y-dbDX7KLSTXQ3f3fIPp8e59OXdPb2_DqdzFJDhexTbeW4Eho5cMgQqDAoiaDURUlYmTLXxpDIK1tysoKEtjqzWVGA1XleFYhDdnfw7YL_2rjYq5XfhHYXqQRCBgDjXYMhg8OXCT7G4CrVheVah60CrvarqNNVFAq1d344MKvY64U7Ejr0S9O4fwT8YkfZ1Doo1-IPUv9yTQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2315111800</pqid></control><display><type>article</type><title>The Photopolymer Science and Technology Award</title><source>J-STAGE (Japan Science & Technology Information Aggregator, Electronic) Freely Available Titles - Japanese</source><source>EZB-FREE-00999 freely available EZB journals</source><source>Free Full-Text Journals in Chemistry</source><creator>Allen, Robert D.</creator><creatorcontrib>Allen, Robert D.</creatorcontrib><description>The Photopolymer Science and Technology Award No. 191100, the Outstanding Achievement Award 2019 was presented to Dr. Allen, Robert D. (IBM Research, Almaden) for his outstanding achievements in photopolymer science and technology, “Pioneering semiconductor patterning technology using water immersion ArF lithography with the originally designed photoresist”.</description><identifier>ISSN: 0914-9244</identifier><identifier>EISSN: 1349-6336</identifier><identifier>DOI: 10.2494/photopolymer.32.3</identifier><language>eng</language><publisher>Hiratsuka: The Society of Photopolymer Science and Technology(SPST)</publisher><subject>Photopolymers ; Photoresists ; Submerging ; The Outstanding Achievement Award ; The Photopolymer Science and Technology Award ; Water immersion ; Water immersion ArF lithography</subject><ispartof>Journal of Photopolymer Science and Technology, 2019/06/24, Vol.32(1), pp.3-5</ispartof><rights>2019 The Society of Photopolymer Science and Technology (SPST)</rights><rights>Copyright Japan Science and Technology Agency 2019</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c479t-ad98f2a3010153147c39441ba7b43fcb6acc426fdb04d242ada5d5771da66f733</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>315,781,785,1884,27929,27930</link.rule.ids></links><search><creatorcontrib>Allen, Robert D.</creatorcontrib><title>The Photopolymer Science and Technology Award</title><title>Journal of Photopolymer Science and Technology</title><addtitle>J. Photopol. Sci. Technol.</addtitle><description>The Photopolymer Science and Technology Award No. 191100, the Outstanding Achievement Award 2019 was presented to Dr. Allen, Robert D. (IBM Research, Almaden) for his outstanding achievements in photopolymer science and technology, “Pioneering semiconductor patterning technology using water immersion ArF lithography with the originally designed photoresist”.</description><subject>Photopolymers</subject><subject>Photoresists</subject><subject>Submerging</subject><subject>The Outstanding Achievement Award</subject><subject>The Photopolymer Science and Technology Award</subject><subject>Water immersion</subject><subject>Water immersion ArF lithography</subject><issn>0914-9244</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><recordid>eNplkF9LwzAUxYMoOKcfwLeCz525ubft8jjmXxgoOJ9DmqTrRtfUpEP27d2cjIFP9-Hc3zmcw9gt8JEgSfdd7Xvf-Wa7dmGEYoRnbABIMs0R83M24BIolYLokl3FuOIcMcvkgKXz2iXvJ3DyYZauNS7RrU3mztStb_xim0y-dbDX7KLSTXQ3f3fIPp8e59OXdPb2_DqdzFJDhexTbeW4Eho5cMgQqDAoiaDURUlYmTLXxpDIK1tysoKEtjqzWVGA1XleFYhDdnfw7YL_2rjYq5XfhHYXqQRCBgDjXYMhg8OXCT7G4CrVheVah60CrvarqNNVFAq1d344MKvY64U7Ejr0S9O4fwT8YkfZ1Doo1-IPUv9yTQ</recordid><startdate>20190624</startdate><enddate>20190624</enddate><creator>Allen, Robert D.</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20190624</creationdate><title>The Photopolymer Science and Technology Award</title><author>Allen, Robert D.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c479t-ad98f2a3010153147c39441ba7b43fcb6acc426fdb04d242ada5d5771da66f733</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>Photopolymers</topic><topic>Photoresists</topic><topic>Submerging</topic><topic>The Outstanding Achievement Award</topic><topic>The Photopolymer Science and Technology Award</topic><topic>Water immersion</topic><topic>Water immersion ArF lithography</topic><toplevel>online_resources</toplevel><creatorcontrib>Allen, Robert D.</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Allen, Robert D.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The Photopolymer Science and Technology Award</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2019-06-24</date><risdate>2019</risdate><volume>32</volume><issue>1</issue><spage>3</spage><epage>5</epage><pages>3-5</pages><issn>0914-9244</issn><eissn>1349-6336</eissn><abstract>The Photopolymer Science and Technology Award No. 191100, the Outstanding Achievement Award 2019 was presented to Dr. Allen, Robert D. (IBM Research, Almaden) for his outstanding achievements in photopolymer science and technology, “Pioneering semiconductor patterning technology using water immersion ArF lithography with the originally designed photoresist”.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.32.3</doi><tpages>3</tpages><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0914-9244 |
| ispartof | Journal of Photopolymer Science and Technology, 2019/06/24, Vol.32(1), pp.3-5 |
| issn | 0914-9244 1349-6336 |
| language | eng |
| recordid | cdi_proquest_journals_2315111800 |
| source | J-STAGE (Japan Science & Technology Information Aggregator, Electronic) Freely Available Titles - Japanese; EZB-FREE-00999 freely available EZB journals; Free Full-Text Journals in Chemistry |
| subjects | Photopolymers Photoresists Submerging The Outstanding Achievement Award The Photopolymer Science and Technology Award Water immersion Water immersion ArF lithography |
| title | The Photopolymer Science and Technology Award |
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