The Photopolymer Science and Technology Award

The Photopolymer Science and Technology Award No. 191100, the Outstanding Achievement Award 2019 was presented to Dr. Allen, Robert D. (IBM Research, Almaden) for his outstanding achievements in photopolymer science and technology, “Pioneering semiconductor patterning technology using water immersio...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2019/06/24, Vol.32(1), pp.3-5
1. Verfasser:	Allen, Robert D.
Format:	Artikel
Sprache:	eng
Schlagworte:	Photopolymers Photoresists Submerging The Outstanding Achievement Award The Photopolymer Science and Technology Award Water immersion Water immersion ArF lithography
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	The Photopolymer Science and Technology Award No. 191100, the Outstanding Achievement Award 2019 was presented to Dr. Allen, Robert D. (IBM Research, Almaden) for his outstanding achievements in photopolymer science and technology, “Pioneering semiconductor patterning technology using water immersion ArF lithography with the originally designed photoresist”.
ISSN:	0914-9244 1349-6336
DOI:	10.2494/photopolymer.32.3