Formation of Ag nanoparticles in Si (100) wafers by single and multiple low energy Ag ions implantation

We investigated the structural and optical changes of Si (100) induced by single or multiple low energy silver ion irradiation with fluences up to 1016 ions/cm2. The irradiated samples were analyzed by the means of Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, transmissio...

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Veröffentlicht in:	Surface & coatings technology 2019-11, Vol.377, p.124913, Article 124913
Hauptverfasser:	Modrić-Šahbazović, A., Novaković, M., Popović, M., Schmidt, E., Gazdić, I., Bibić, N., Ronning, C., Rakočević, Z.
Format:	Artikel
Sprache:	eng
Schlagworte:	Absorption spectra Ag nanoparticles Amorphization Backscattering Fluence Ion beam implantation Ion implantation Ion irradiation Nanoparticles Photoelectrons Resonance Silicon substrates Silver Spectroellipsometry Spectroscopic ellipsometry Surface plasmon resonance TEM analysis
Online-Zugang:	Volltext
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