On the role of secondary electron emission in capacitively coupled radio‐frequency plasma sheath: A theoretical ground

We propose a theoretical ground for emissive capacitively coupled radio‐frequency (rf) plasma sheath under low pressure. The rf sheath is assumed to be collisionless and oscillates with external source. A known sinusoidal voltage instead of current is taken as prerequisite to derive sheath dynamics....

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Veröffentlicht in:	Plasma processes and polymers 2019-11, Vol.16 (11), p.n/a
Hauptverfasser:	Sun, Guang‐Yu, Li, Han‐Wei, Sun, An‐Bang, Li, Yuan, Song, Bai‐Peng, Mu, Hai‐Bao, Li, Xiao‐Ran, Zhang, Guan‐Jun
Format:	Artikel
Sprache:	eng
Schlagworte:	capacitively coupled plasma Computer simulation Direct current Electric potential Electron emission Ionization kinetic theory Low pressure modeling Plasma Plasma sheaths secondary electron emission Secondary emission surfaces Voltage
Online-Zugang:	Volltext
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