Kinetic mechanism of conformal magnesium silicide (Mg2Si) film formation via reaction of Si single crystals with Mg vapor

Patterned Mg 2 Si structures can be attractive for use in optoelectronic, thermoelectric, and other devices. Such structures can be fabricated as conformal Mg 2 Si films on patterned Si substrates via direct reaction of these substrates with Mg vapor at modest temperatures and ambient pressure. Here...

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Veröffentlicht in:Journal of materials science 2020, Vol.55 (3), p.1107-1116
Hauptverfasser: Li, Jiaqi, Hwang, SungHwan, Itskos, Grigorios, Sandhage, Kenneth H.
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Sprache:eng
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