Fabrication of porous thick films using room‐temperature aerosol deposition

A novel technique for the rapid room‐temperature deposition of porous ceramic, glass, or metal thick films using the aerosol deposition (AD) method is presented. The process is based on the co‐deposition of the desired film material and a second water‐soluble constituent, resulting in a ceramic‐cera...

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Veröffentlicht in:Journal of the American Ceramic Society 2020-01, Vol.103 (1), p.43-47
Hauptverfasser: Khansur, Neamul H., Eckstein, Udo, Sadl, Matej, Ursic, Hana, Webber, Kyle G.
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container_issue 1
container_start_page 43
container_title Journal of the American Ceramic Society
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creator Khansur, Neamul H.
Eckstein, Udo
Sadl, Matej
Ursic, Hana
Webber, Kyle G.
description A novel technique for the rapid room‐temperature deposition of porous ceramic, glass, or metal thick films using the aerosol deposition (AD) method is presented. The process is based on the co‐deposition of the desired film material and a second water‐soluble constituent, resulting in a ceramic‐ceramic composite. Following the subsequent removal of water‐soluble end member, a network of pores is retained. To demonstrate the process, porous BaTiO3 thick films were fabricated through co‐deposition with NaCl. Microstructural images show the clear development of a porous structure, which was found to enhance the dielectric properties over dense thick films, possibly related to the lower extent of internal residual stress. This simple but highly effective porous structure fabrication can be applied to any film and substrate material stable in water and is promising for the application of AD‐processed films in gas sensors, solid oxide fuel cells, and humidity sensors.
doi_str_mv 10.1111/jace.16772
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subjects Barium titanates
ceramic matrix composites
Ceramics
Deposition
dielectric materials/properties
Dielectric properties
Gas sensors
porous materials
Residual stress
Room temperature
sensors
Solid oxide fuel cells
Substrates
Thick films
title Fabrication of porous thick films using room‐temperature aerosol deposition
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