Potential profile near the virtual cathode in presence of charged dust

In this work, concept of virtual cathode and its existence in dusty plasma has been studied by theoretical and numerical analysis. Using basic equations of charge dust, ions, and electrons, the non‐monotonic behaviour of the potential in presence of charged dust has been calculated and plotted as a...

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Veröffentlicht in:Contributions to plasma physics (1988) 2019-09, Vol.59 (8), p.n/a
Hauptverfasser: Rathod, Dinesh, Dash, Saroj Kumar, Sarma, Arun
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description In this work, concept of virtual cathode and its existence in dusty plasma has been studied by theoretical and numerical analysis. Using basic equations of charge dust, ions, and electrons, the non‐monotonic behaviour of the potential in presence of charged dust has been calculated and plotted as a function of dust density. It has been found that there is a change in potential between cathode and sheath potential and subsequently changes the threshold wall temperature as compared to that of without dust conditions. The threshold wall temperature has been increased due to the ability of micro‐particles acquiring electron charge and hence, reducing potential at the wall. Further, for different values of α (depends on dust density); threshold temperature remained the same for observed virtual cathode. Hence, behaviour of potential has been plotted as a function of α with increasing wall temperatures for two dust charge values (1 and 1,000). Considering no dust charge, it has been observed that, at lower dust density, double layer like structure is formed near the emissive wall. But this double layer structure gets diminishes with increasing dust density. Hence, below a threshold dust density, virtual cathode near to the emissive wall is not possible. While for Zd = 1,000, the formation of virtual cathode appeared even at very small dust density. However, irrespective of variation of potential difference near the wall and existence of virtual cathode at different emission regime the threshold wall temperature remains same. Effect of dust potential dependency on threshold wall temperature has also been discussed in this study.
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subjects Cathodes
Density
double sheath
Dust
dusty plasma
Dusty plasmas
Numerical analysis
potential difference
Sheaths
Temperature
Temperature dependence
Temperature effects
virtual cathode
Wall temperature
title Potential profile near the virtual cathode in presence of charged dust
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