Study of microwave discharge at high power density conditions in diamond chemical vapor deposition reactor by optical emission spectroscopy

The paper presents results of measurements of spatial distributions of emission intensity of various lines of argon, atomic hydrogen, C2 and CH molecules in a wide pressure range from 40 to 500 Torr in diamond chemical vapor deposition (CVD) reactor. Microwave discharge plasma was maintained in reac...

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Veröffentlicht in:	Diamond and related materials 2019-08, Vol.97, p.107407, Article 107407
Hauptverfasser:	Bogdanov, S.A., Gorbachev, A.M., Vikharev, A.L., Radishev, D.B., Lobaev, M.A.
Format:	Artikel
Sprache:	eng
Schlagworte:	Argon Chemical vapor deposition Diagnostic systems Diamonds Hydrogen Hydrogen atoms Microwave discharge Microwave plasma assisted CVD reactor Microwave power density Optical emission spectroscopy Organic chemistry Spatial distribution Substrates
Online-Zugang:	Volltext
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