Pulsed Laser Deposition and Properties of M n+1AX n Phase Formulated Ti3SiC2 Thin Films

The ternary phase ceramic, Ti3SiC2, has often been synthesized through reactive hot pressing, providing bulk samples for studying its mechanical and physical properties. Chemical vapor deposition has been the most popular route to make Ti3SiC2 films. Recently, magnetron sputtering (MS) and pulsed laser deposition (PLD) have been used to produce good quality films. In this paper, we present the results on the synthesis and tribological characterization of Ti3SiC2 thin films prepared by PLD. The films had a surface roughness of 0.46 nm, a friction coefficient of 0.2 in humid air, and hardness of between 30 and 40 GPa. The transfer films were identified on the surface of counterparts using scanning electron microscopy. Anisotropic layer structure of Ti3SiC2 and nano crystallites in the coatings observed by X-ray diffraction and transmission electron microscopy are related to the low friction and high hardness. A specially designed sample coated with half Ti3SiC2 and half TiC was fabricated for comparing the properties between the two materials using a lateral force microscope. Lateral force images of the coatings indicated that the lateral force against Ti3SiC2 was lower than against TiC. PLD Ti3SiC2 coatings may be produced at near room temperature to 300 °C, which is acceptable for many commercial applications.