Revised dependent siphons
The number of problematic siphons grows exponentially with the size of net, resulting in many monitors to prevent from reaching deadlocks. Li and Zhou propose the concept of elementary siphons so that many problematic siphons, called dependent siphons, do not need monitors. They indicate that it is...
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| Veröffentlicht in: | International journal of advanced manufacturing technology 2009-07, Vol.43 (1-2), p.182-188 |
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| container_title | International journal of advanced manufacturing technology |
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| creator | Chao, Daniel Y. |
| description | The number of problematic siphons grows exponentially with the size of net, resulting in many monitors to prevent from reaching deadlocks. Li and Zhou propose the concept of elementary siphons so that many problematic siphons, called dependent siphons, do not need monitors. They indicate that it is not limited to simple sequential processes with resources (S
3
PR) and may be extended to arbitrary nets. S
3
PMR is a generalization of S
3
PR by allowing a job place to use more than one resource. Also, when entering the next operation place, it may not release the resource. We demonstrate a counter-example by showing that the dependent condition may be relaxed so that an elementary siphon, while requiring a monitor previously, may be controlled after some elementary siphons get controlled. |
| doi_str_mv | 10.1007/s00170-008-1684-1 |
| format | Article |
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3
PR) and may be extended to arbitrary nets. S
3
PMR is a generalization of S
3
PR by allowing a job place to use more than one resource. Also, when entering the next operation place, it may not release the resource. We demonstrate a counter-example by showing that the dependent condition may be relaxed so that an elementary siphon, while requiring a monitor previously, may be controlled after some elementary siphons get controlled.</description><identifier>ISSN: 0268-3768</identifier><identifier>EISSN: 1433-3015</identifier><identifier>DOI: 10.1007/s00170-008-1684-1</identifier><language>eng</language><publisher>London: Springer-Verlag</publisher><subject>CAE) and Design ; Computer-Aided Engineering (CAD ; Engineering ; Industrial and Production Engineering ; Mechanical Engineering ; Media Management ; Monitors ; Original Article ; Siphons</subject><ispartof>International journal of advanced manufacturing technology, 2009-07, Vol.43 (1-2), p.182-188</ispartof><rights>Springer-Verlag London Limited 2008</rights><rights>The International Journal of Advanced Manufacturing Technology is a copyright of Springer, (2008). All Rights Reserved.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c316t-eb8022a0fb96967ecb87a32389a804937d6e856a211de82fdfc0f3a9aecde6533</citedby><cites>FETCH-LOGICAL-c316t-eb8022a0fb96967ecb87a32389a804937d6e856a211de82fdfc0f3a9aecde6533</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s00170-008-1684-1$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s00170-008-1684-1$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,41488,42557,51319</link.rule.ids></links><search><creatorcontrib>Chao, Daniel Y.</creatorcontrib><title>Revised dependent siphons</title><title>International journal of advanced manufacturing technology</title><addtitle>Int J Adv Manuf Technol</addtitle><description>The number of problematic siphons grows exponentially with the size of net, resulting in many monitors to prevent from reaching deadlocks. Li and Zhou propose the concept of elementary siphons so that many problematic siphons, called dependent siphons, do not need monitors. They indicate that it is not limited to simple sequential processes with resources (S
3
PR) and may be extended to arbitrary nets. S
3
PMR is a generalization of S
3
PR by allowing a job place to use more than one resource. Also, when entering the next operation place, it may not release the resource. We demonstrate a counter-example by showing that the dependent condition may be relaxed so that an elementary siphon, while requiring a monitor previously, may be controlled after some elementary siphons get controlled.</description><subject>CAE) and Design</subject><subject>Computer-Aided Engineering (CAD</subject><subject>Engineering</subject><subject>Industrial and Production Engineering</subject><subject>Mechanical Engineering</subject><subject>Media Management</subject><subject>Monitors</subject><subject>Original Article</subject><subject>Siphons</subject><issn>0268-3768</issn><issn>1433-3015</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><sourceid>AFKRA</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><recordid>eNp1kEFLxDAQRoMoWFd_wN4WPEdnkjZJj7KoKywIoueQNhPtom1NuoL_3iwVPHmay3vfwGNsiXCFAPo6AaAGDmA4KlNyPGIFllJyCVgdswKEMlxqZU7ZWUq7TKvMFWz5RF9dIr_yNFLvqZ9WqRvfhj6ds5Pg3hNd_N4Fe7m7fV5v-Pbx_mF9s-WtRDVxagwI4SA0taqVprYx2kkhTe0MlLXUXpGplBOInowIPrQQpKsdtZ5UJeWCXc67Yxw-95Qmuxv2sc8vrRBKVKgNmkzhTLVxSClSsGPsPlz8tgj2UMDOBWwuYA8FLGZHzE7KbP9K8W_5f-kHiJJcQw</recordid><startdate>20090701</startdate><enddate>20090701</enddate><creator>Chao, Daniel Y.</creator><general>Springer-Verlag</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>AFKRA</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>L6V</scope><scope>M7S</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PTHSS</scope></search><sort><creationdate>20090701</creationdate><title>Revised dependent siphons</title><author>Chao, Daniel Y.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c316t-eb8022a0fb96967ecb87a32389a804937d6e856a211de82fdfc0f3a9aecde6533</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>CAE) and Design</topic><topic>Computer-Aided Engineering (CAD</topic><topic>Engineering</topic><topic>Industrial and Production Engineering</topic><topic>Mechanical Engineering</topic><topic>Media Management</topic><topic>Monitors</topic><topic>Original Article</topic><topic>Siphons</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Chao, Daniel Y.</creatorcontrib><collection>CrossRef</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Central Korea</collection><collection>SciTech Premium Collection</collection><collection>ProQuest Engineering Collection</collection><collection>Engineering Database</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>Engineering Collection</collection><jtitle>International journal of advanced manufacturing technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Chao, Daniel Y.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Revised dependent siphons</atitle><jtitle>International journal of advanced manufacturing technology</jtitle><stitle>Int J Adv Manuf Technol</stitle><date>2009-07-01</date><risdate>2009</risdate><volume>43</volume><issue>1-2</issue><spage>182</spage><epage>188</epage><pages>182-188</pages><issn>0268-3768</issn><eissn>1433-3015</eissn><abstract>The number of problematic siphons grows exponentially with the size of net, resulting in many monitors to prevent from reaching deadlocks. Li and Zhou propose the concept of elementary siphons so that many problematic siphons, called dependent siphons, do not need monitors. They indicate that it is not limited to simple sequential processes with resources (S
3
PR) and may be extended to arbitrary nets. S
3
PMR is a generalization of S
3
PR by allowing a job place to use more than one resource. Also, when entering the next operation place, it may not release the resource. We demonstrate a counter-example by showing that the dependent condition may be relaxed so that an elementary siphon, while requiring a monitor previously, may be controlled after some elementary siphons get controlled.</abstract><cop>London</cop><pub>Springer-Verlag</pub><doi>10.1007/s00170-008-1684-1</doi><tpages>7</tpages></addata></record> |
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| identifier | ISSN: 0268-3768 |
| ispartof | International journal of advanced manufacturing technology, 2009-07, Vol.43 (1-2), p.182-188 |
| issn | 0268-3768 1433-3015 |
| language | eng |
| recordid | cdi_proquest_journals_2262517818 |
| source | SpringerNature Journals |
| subjects | CAE) and Design Computer-Aided Engineering (CAD Engineering Industrial and Production Engineering Mechanical Engineering Media Management Monitors Original Article Siphons |
| title | Revised dependent siphons |
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