High-resolution, spatially-resolved surface potential investigations of high-strength metallurgical graphene using scanning tunnelling potentiometry
Here we present an approach to measure the surface potential distribution of specimens using scanning tunnelling potentiometry with high potential gradients and relatively low sample bias. A special design of test structures containing pre-patterned electrodes was employed. Material of interest is t...
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Veröffentlicht in: | Microelectronic engineering 2019-05, Vol.212, p.1-8 |
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creator | Gajewski, Krzysztof Kunicki, Piotr Sierakowski, Andrzej Szymański, Witold Kaczorowski, Witold Niedzielski, Piotr Ramadan, Sami Shaforost, Olena Klein, Norbert Hao, Ling Gotszalk, Teodor |
description | Here we present an approach to measure the surface potential distribution of specimens using scanning tunnelling potentiometry with high potential gradients and relatively low sample bias. A special design of test structures containing pre-patterned electrodes was employed. Material of interest is transferred onto test structures, so that additional material processing during the investigations can be avoided. The utility of this solution is assessed in an investigation of high–strength metallurgical graphene. A maximum potential gradient of 49.2 V/mm was obtained by applying a sample bias of 0.8 V. Values of the resistivity of graphene inclusions up to 450 Ω·μm were observed. The influence of inclusions could be reduced by performing controllable post-transfer annealing. This could remove polymer residue from the graphene surface, but may introduce additional features in the Raman spectra. Work functions of 4.68–4.70 eV were estimated using Kelvin probe force microscopy.
[Display omitted]
•A method for surface potential measurement using high electric field is proposed.•The utility of this method is was shown during High Strength Metallurgical Graphene investigation.•Maximum potential gradient used was 49.2 V/mm.•Potential drop caused by residues with resistivity up to 450 Ω·μm were observed. |
doi_str_mv | 10.1016/j.mee.2019.03.023 |
format | Article |
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[Display omitted]
•A method for surface potential measurement using high electric field is proposed.•The utility of this method is was shown during High Strength Metallurgical Graphene investigation.•Maximum potential gradient used was 49.2 V/mm.•Potential drop caused by residues with resistivity up to 450 Ω·μm were observed.</description><identifier>ISSN: 0167-9317</identifier><identifier>EISSN: 1873-5568</identifier><identifier>DOI: 10.1016/j.mee.2019.03.023</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Annealing ; Bias ; Electric potential ; Electrical measurement ; Graphene ; Graphite ; Inclusions ; KPFM ; Mechanical properties ; Metallurgical analysis ; Polymers ; Potential distribution ; Potential gradient ; Potentiometric analysis ; Raman spectra ; Raman spectroscopy ; Scanning ; Scanning electron microscopy ; SEM ; STP ; Work functions</subject><ispartof>Microelectronic engineering, 2019-05, Vol.212, p.1-8</ispartof><rights>2019 Elsevier B.V.</rights><rights>Copyright Elsevier BV May 1, 2019</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c325t-1d3a7d46b74a1e0c90147738b16a52be53f9140d33183cc7f3b55a7fed4d1f5f3</citedby><cites>FETCH-LOGICAL-c325t-1d3a7d46b74a1e0c90147738b16a52be53f9140d33183cc7f3b55a7fed4d1f5f3</cites><orcidid>0000-0001-6218-0658</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0167931719300656$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3537,27901,27902,65306</link.rule.ids></links><search><creatorcontrib>Gajewski, Krzysztof</creatorcontrib><creatorcontrib>Kunicki, Piotr</creatorcontrib><creatorcontrib>Sierakowski, Andrzej</creatorcontrib><creatorcontrib>Szymański, Witold</creatorcontrib><creatorcontrib>Kaczorowski, Witold</creatorcontrib><creatorcontrib>Niedzielski, Piotr</creatorcontrib><creatorcontrib>Ramadan, Sami</creatorcontrib><creatorcontrib>Shaforost, Olena</creatorcontrib><creatorcontrib>Klein, Norbert</creatorcontrib><creatorcontrib>Hao, Ling</creatorcontrib><creatorcontrib>Gotszalk, Teodor</creatorcontrib><title>High-resolution, spatially-resolved surface potential investigations of high-strength metallurgical graphene using scanning tunnelling potentiometry</title><title>Microelectronic engineering</title><description>Here we present an approach to measure the surface potential distribution of specimens using scanning tunnelling potentiometry with high potential gradients and relatively low sample bias. A special design of test structures containing pre-patterned electrodes was employed. Material of interest is transferred onto test structures, so that additional material processing during the investigations can be avoided. The utility of this solution is assessed in an investigation of high–strength metallurgical graphene. A maximum potential gradient of 49.2 V/mm was obtained by applying a sample bias of 0.8 V. Values of the resistivity of graphene inclusions up to 450 Ω·μm were observed. The influence of inclusions could be reduced by performing controllable post-transfer annealing. This could remove polymer residue from the graphene surface, but may introduce additional features in the Raman spectra. Work functions of 4.68–4.70 eV were estimated using Kelvin probe force microscopy.
[Display omitted]
•A method for surface potential measurement using high electric field is proposed.•The utility of this method is was shown during High Strength Metallurgical Graphene investigation.•Maximum potential gradient used was 49.2 V/mm.•Potential drop caused by residues with resistivity up to 450 Ω·μm were observed.</description><subject>Annealing</subject><subject>Bias</subject><subject>Electric potential</subject><subject>Electrical measurement</subject><subject>Graphene</subject><subject>Graphite</subject><subject>Inclusions</subject><subject>KPFM</subject><subject>Mechanical properties</subject><subject>Metallurgical analysis</subject><subject>Polymers</subject><subject>Potential distribution</subject><subject>Potential gradient</subject><subject>Potentiometric analysis</subject><subject>Raman spectra</subject><subject>Raman spectroscopy</subject><subject>Scanning</subject><subject>Scanning electron microscopy</subject><subject>SEM</subject><subject>STP</subject><subject>Work functions</subject><issn>0167-9317</issn><issn>1873-5568</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><recordid>eNp9kM1OxCAUhYnRxHH0AdyRuLUVSimduDLGv8TEja4JQy8dJh2oQCeZ9_CBpRnXru69cL5z4SB0TUlJCW3utuUOoKwIXZWElaRiJ2hBW8EKzpv2FC2yRhQrRsU5uohxS_Jck3aBfl5tvykCRD9MyXp3i-OoklXDcDie7qHDcQpGacCjT-DmS2zdHmKyvZqZiL3Bm9knpgCuTxu8g5QtptBbndV9UOMGHOApWtfjqJVzc5Mm52AY5vbP2mcwHC7RmVFDhKu_ukRfz0-fj6_F-8fL2-PDe6FZxVNBO6ZEVzdrUSsKRK8IrYVg7Zo2ildr4MysaE06xmjLtBaGrTlXwkBXd9Rww5bo5ug7Bv895Q_JrZ-CyytlVbG6blpOSFbRo0oHH2MAI8dgdyocJCVyDl9uZQ5fzuFLwmQOPzP3Rwby8_cWgozagtPQ2QA6yc7bf-hfsZyR4Q</recordid><startdate>20190501</startdate><enddate>20190501</enddate><creator>Gajewski, Krzysztof</creator><creator>Kunicki, Piotr</creator><creator>Sierakowski, Andrzej</creator><creator>Szymański, Witold</creator><creator>Kaczorowski, Witold</creator><creator>Niedzielski, Piotr</creator><creator>Ramadan, Sami</creator><creator>Shaforost, Olena</creator><creator>Klein, Norbert</creator><creator>Hao, Ling</creator><creator>Gotszalk, Teodor</creator><general>Elsevier B.V</general><general>Elsevier BV</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0001-6218-0658</orcidid></search><sort><creationdate>20190501</creationdate><title>High-resolution, spatially-resolved surface potential investigations of high-strength metallurgical graphene using scanning tunnelling potentiometry</title><author>Gajewski, Krzysztof ; Kunicki, Piotr ; Sierakowski, Andrzej ; Szymański, Witold ; Kaczorowski, Witold ; Niedzielski, Piotr ; Ramadan, Sami ; Shaforost, Olena ; Klein, Norbert ; Hao, Ling ; Gotszalk, Teodor</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c325t-1d3a7d46b74a1e0c90147738b16a52be53f9140d33183cc7f3b55a7fed4d1f5f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>Annealing</topic><topic>Bias</topic><topic>Electric potential</topic><topic>Electrical measurement</topic><topic>Graphene</topic><topic>Graphite</topic><topic>Inclusions</topic><topic>KPFM</topic><topic>Mechanical properties</topic><topic>Metallurgical analysis</topic><topic>Polymers</topic><topic>Potential distribution</topic><topic>Potential gradient</topic><topic>Potentiometric analysis</topic><topic>Raman spectra</topic><topic>Raman spectroscopy</topic><topic>Scanning</topic><topic>Scanning electron microscopy</topic><topic>SEM</topic><topic>STP</topic><topic>Work functions</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Gajewski, Krzysztof</creatorcontrib><creatorcontrib>Kunicki, Piotr</creatorcontrib><creatorcontrib>Sierakowski, Andrzej</creatorcontrib><creatorcontrib>Szymański, Witold</creatorcontrib><creatorcontrib>Kaczorowski, Witold</creatorcontrib><creatorcontrib>Niedzielski, Piotr</creatorcontrib><creatorcontrib>Ramadan, Sami</creatorcontrib><creatorcontrib>Shaforost, Olena</creatorcontrib><creatorcontrib>Klein, Norbert</creatorcontrib><creatorcontrib>Hao, Ling</creatorcontrib><creatorcontrib>Gotszalk, Teodor</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Microelectronic engineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Gajewski, Krzysztof</au><au>Kunicki, Piotr</au><au>Sierakowski, Andrzej</au><au>Szymański, Witold</au><au>Kaczorowski, Witold</au><au>Niedzielski, Piotr</au><au>Ramadan, Sami</au><au>Shaforost, Olena</au><au>Klein, Norbert</au><au>Hao, Ling</au><au>Gotszalk, Teodor</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>High-resolution, spatially-resolved surface potential investigations of high-strength metallurgical graphene using scanning tunnelling potentiometry</atitle><jtitle>Microelectronic engineering</jtitle><date>2019-05-01</date><risdate>2019</risdate><volume>212</volume><spage>1</spage><epage>8</epage><pages>1-8</pages><issn>0167-9317</issn><eissn>1873-5568</eissn><abstract>Here we present an approach to measure the surface potential distribution of specimens using scanning tunnelling potentiometry with high potential gradients and relatively low sample bias. A special design of test structures containing pre-patterned electrodes was employed. Material of interest is transferred onto test structures, so that additional material processing during the investigations can be avoided. The utility of this solution is assessed in an investigation of high–strength metallurgical graphene. A maximum potential gradient of 49.2 V/mm was obtained by applying a sample bias of 0.8 V. Values of the resistivity of graphene inclusions up to 450 Ω·μm were observed. The influence of inclusions could be reduced by performing controllable post-transfer annealing. This could remove polymer residue from the graphene surface, but may introduce additional features in the Raman spectra. Work functions of 4.68–4.70 eV were estimated using Kelvin probe force microscopy.
[Display omitted]
•A method for surface potential measurement using high electric field is proposed.•The utility of this method is was shown during High Strength Metallurgical Graphene investigation.•Maximum potential gradient used was 49.2 V/mm.•Potential drop caused by residues with resistivity up to 450 Ω·μm were observed.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.mee.2019.03.023</doi><tpages>8</tpages><orcidid>https://orcid.org/0000-0001-6218-0658</orcidid></addata></record> |
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subjects | Annealing Bias Electric potential Electrical measurement Graphene Graphite Inclusions KPFM Mechanical properties Metallurgical analysis Polymers Potential distribution Potential gradient Potentiometric analysis Raman spectra Raman spectroscopy Scanning Scanning electron microscopy SEM STP Work functions |
title | High-resolution, spatially-resolved surface potential investigations of high-strength metallurgical graphene using scanning tunnelling potentiometry |
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