Formation of Fine Pattern from Polyarylate-Silicone Copolymer by the Application of Reaction Development Patterning
Multi-block copolymers between polyester (polyarylate) and polydimethylsiloxane were prepared by polycondensation using polydimethylsiloxane having p-hydroxyphenyl groups at its both chain ends as a diol monomer. The copolymer gave positive-tone fine pattern by the reaction development patterning wi...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2017/06/26, Vol.30(2), pp.177-180 |
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| container_title | Journal of Photopolymer Science and Technology |
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| creator | Tokoro, Yuichiro Miyoshi, Mariko Oyama, Toshiyuki |
| description | Multi-block copolymers between polyester (polyarylate) and polydimethylsiloxane were prepared by polycondensation using polydimethylsiloxane having p-hydroxyphenyl groups at its both chain ends as a diol monomer. The copolymer gave positive-tone fine pattern by the reaction development patterning with developer containing ethanolamine as a nucleophile. The silicone unit hybridized with polyarylate enabled pattern formation from dry film by contributing not only to high photosensitivity but also to high dissolution rate at the photo-irradiated area. Use of polyarylate instead of the copolymer resulted in unsuccessful pattern formation from dry film. |
| doi_str_mv | 10.2494/photopolymer.30.177 |
| format | Article |
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The copolymer gave positive-tone fine pattern by the reaction development patterning with developer containing ethanolamine as a nucleophile. The silicone unit hybridized with polyarylate enabled pattern formation from dry film by contributing not only to high photosensitivity but also to high dissolution rate at the photo-irradiated area. Use of polyarylate instead of the copolymer resulted in unsuccessful pattern formation from dry film.</description><identifier>ISSN: 0914-9244</identifier><identifier>EISSN: 1349-6336</identifier><identifier>DOI: 10.2494/photopolymer.30.177</identifier><language>eng</language><publisher>Hiratsuka: The Society of Photopolymer Science and Technology(SPST)</publisher><subject>Block copolymers ; Diazonaphthoquinone (DNQ) ; Patterning ; Photosensitive polyarylate ; Photosensitivity ; Polyarylate-silicone copolymer ; Polyarylates ; Polydimethylsiloxane ; Reaction development patterning (RDP)</subject><ispartof>Journal of Photopolymer Science and Technology, 2017/06/26, Vol.30(2), pp.177-180</ispartof><rights>2017 The Society of Photopolymer Science and Technology (SPST)</rights><rights>Copyright Japan Science and Technology Agency 2017</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c535t-309fdc0f89c7cf5751d2acbac8cb5c8cc08d6bfad6e87df4177b64f8f81b43a03</citedby><cites>FETCH-LOGICAL-c535t-309fdc0f89c7cf5751d2acbac8cb5c8cc08d6bfad6e87df4177b64f8f81b43a03</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,1877,27901,27902</link.rule.ids></links><search><creatorcontrib>Tokoro, Yuichiro</creatorcontrib><creatorcontrib>Miyoshi, Mariko</creatorcontrib><creatorcontrib>Oyama, Toshiyuki</creatorcontrib><title>Formation of Fine Pattern from Polyarylate-Silicone Copolymer by the Application of Reaction Development Patterning</title><title>Journal of Photopolymer Science and Technology</title><addtitle>J. Photopol. Sci. Technol.</addtitle><description>Multi-block copolymers between polyester (polyarylate) and polydimethylsiloxane were prepared by polycondensation using polydimethylsiloxane having p-hydroxyphenyl groups at its both chain ends as a diol monomer. The copolymer gave positive-tone fine pattern by the reaction development patterning with developer containing ethanolamine as a nucleophile. The silicone unit hybridized with polyarylate enabled pattern formation from dry film by contributing not only to high photosensitivity but also to high dissolution rate at the photo-irradiated area. Use of polyarylate instead of the copolymer resulted in unsuccessful pattern formation from dry film.</description><subject>Block copolymers</subject><subject>Diazonaphthoquinone (DNQ)</subject><subject>Patterning</subject><subject>Photosensitive polyarylate</subject><subject>Photosensitivity</subject><subject>Polyarylate-silicone copolymer</subject><subject>Polyarylates</subject><subject>Polydimethylsiloxane</subject><subject>Reaction development patterning (RDP)</subject><issn>0914-9244</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2017</creationdate><recordtype>article</recordtype><recordid>eNplkFtLAzEQhYMoWKu_wJeAz1uzm2Qvj6W6VShYvDyHbHbSbtndrEkq9N8b7QXBl5mBOd85zCB0G5NJwgp2P6yNN4Npdx3YCSWTOMvO0CimrIhSStNzNCJFzKIiYewSXTm3IYRSzosRcqWxnfSN6bHRuGx6wEvpPdgea2s6vAym0u5a6SF6a9pGmaCYHbNwtcN-DXg6DGF1snkFqX7nB_iC1gwd9P5o2_Sra3ShZevg5tDH6KN8fJ89RYuX-fNsuogUp9xHlBS6VkTnhcqU5hmP60SqSqpcVTwURfI6rbSsU8izWrNwdJUynes8rhiVhI7R3d53sOZzC86LjdnaPkSKJKFJSjhLWVDRvUpZ45wFLQbbdOFmERPx813x97uCEhGCAlXuqY3zcgUnRlrfqBb-MckBPAnUWloBPf0GGo2Pfg</recordid><startdate>20170101</startdate><enddate>20170101</enddate><creator>Tokoro, Yuichiro</creator><creator>Miyoshi, Mariko</creator><creator>Oyama, Toshiyuki</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20170101</creationdate><title>Formation of Fine Pattern from Polyarylate-Silicone Copolymer by the Application of Reaction Development Patterning</title><author>Tokoro, Yuichiro ; Miyoshi, Mariko ; Oyama, Toshiyuki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c535t-309fdc0f89c7cf5751d2acbac8cb5c8cc08d6bfad6e87df4177b64f8f81b43a03</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2017</creationdate><topic>Block copolymers</topic><topic>Diazonaphthoquinone (DNQ)</topic><topic>Patterning</topic><topic>Photosensitive polyarylate</topic><topic>Photosensitivity</topic><topic>Polyarylate-silicone copolymer</topic><topic>Polyarylates</topic><topic>Polydimethylsiloxane</topic><topic>Reaction development patterning (RDP)</topic><toplevel>online_resources</toplevel><creatorcontrib>Tokoro, Yuichiro</creatorcontrib><creatorcontrib>Miyoshi, Mariko</creatorcontrib><creatorcontrib>Oyama, Toshiyuki</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Tokoro, Yuichiro</au><au>Miyoshi, Mariko</au><au>Oyama, Toshiyuki</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Formation of Fine Pattern from Polyarylate-Silicone Copolymer by the Application of Reaction Development Patterning</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2017-01-01</date><risdate>2017</risdate><volume>30</volume><issue>2</issue><spage>177</spage><epage>180</epage><pages>177-180</pages><issn>0914-9244</issn><eissn>1349-6336</eissn><abstract>Multi-block copolymers between polyester (polyarylate) and polydimethylsiloxane were prepared by polycondensation using polydimethylsiloxane having p-hydroxyphenyl groups at its both chain ends as a diol monomer. The copolymer gave positive-tone fine pattern by the reaction development patterning with developer containing ethanolamine as a nucleophile. The silicone unit hybridized with polyarylate enabled pattern formation from dry film by contributing not only to high photosensitivity but also to high dissolution rate at the photo-irradiated area. Use of polyarylate instead of the copolymer resulted in unsuccessful pattern formation from dry film.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.30.177</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
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| ispartof | Journal of Photopolymer Science and Technology, 2017/06/26, Vol.30(2), pp.177-180 |
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| source | J-STAGE Free; EZB-FREE-00999 freely available EZB journals; Free Full-Text Journals in Chemistry |
| subjects | Block copolymers Diazonaphthoquinone (DNQ) Patterning Photosensitive polyarylate Photosensitivity Polyarylate-silicone copolymer Polyarylates Polydimethylsiloxane Reaction development patterning (RDP) |
| title | Formation of Fine Pattern from Polyarylate-Silicone Copolymer by the Application of Reaction Development Patterning |
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