Time-resolved Analysis of Resist Stripping Phenomenon Using Laser Irradiation
Resist stripping phenomenon with laser irradiation was observed by using a time-resolved analysis. The time change of the resist stripping phenomenon by a probe laser irradiation was observed from the viewpoint of the intensity change of the probe laser. As for the laser irradiation in the water, th...
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Veröffentlicht in: | Journal of Photopolymer Science and Technology 2018/06/25, Vol.31(3), pp.413-418 |
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container_title | Journal of Photopolymer Science and Technology |
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creator | Kamimura, Tomosumi Umeda, Yuji Kuramae, Hiroyuki Nuno, Kosuke Nakamura, Ryosuke Horibe, Hideo |
description | Resist stripping phenomenon with laser irradiation was observed by using a time-resolved analysis. The time change of the resist stripping phenomenon by a probe laser irradiation was observed from the viewpoint of the intensity change of the probe laser. As for the laser irradiation in the water, the probe laser intensity arrived at the maximum after around 40 μs. During the pump laser irradiation of 8 ns, a large compressive stress of -10 MPa was confirmed inside the resist from the FE analysis results. The generation of this compression stress is important for starting the resist stripping process, and is thought to improve the resist removal efficiency. |
doi_str_mv | 10.2494/photopolymer.31.413 |
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fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2232589475</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2232589475</sourcerecordid><originalsourceid>FETCH-LOGICAL-c572t-3d7d219079006b784cde7aabdb63457a2b855cc626f90fb728cf4b3033416fc03</originalsourceid><addsrcrecordid>eNplkFFLwzAUhYMoOKe_wJeCz51JbtI0j2M4HUwU3Z5DmqZbRtvUpBP27-3YEMGHy70cznc5HITuCZ5QJtljt_W973x9aGyYAJkwAhdoRIDJNAPILtEIS8JSSRm7Rjcx7jAG4FyO0OvKNTYNNvr625bJtNX1IbqY-Cr5sMPRJ599cF3n2k3yvrWtb4Zpk3U8CksdbUgWIejS6d759hZdVbqO9u68x2g9f1rNXtLl2_NiNl2mhgvap1CKkhKJhcQ4K0TOTGmF1kVZZMC40LTIOTcmo1klcVUImpuKFTBkZiSrDIYxejj97YL_2tvYq53fhyF7VJQC5blkgg8uOLlM8DEGW6kuuEaHgyJYHXtTf3tTQNTQ20DNT9Qu9npjfxkdemdq-4-BM_hrMFsdlG3hBzS0f5w</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2232589475</pqid></control><display><type>article</type><title>Time-resolved Analysis of Resist Stripping Phenomenon Using Laser Irradiation</title><source>J-STAGE (Japan Science & Technology Information Aggregator, Electronic) Freely Available Titles - Japanese</source><source>EZB-FREE-00999 freely available EZB journals</source><source>Free Full-Text Journals in Chemistry</source><creator>Kamimura, Tomosumi ; Umeda, Yuji ; Kuramae, Hiroyuki ; Nuno, Kosuke ; Nakamura, Ryosuke ; Horibe, Hideo</creator><creatorcontrib>Kamimura, Tomosumi ; Umeda, Yuji ; Kuramae, Hiroyuki ; Nuno, Kosuke ; Nakamura, Ryosuke ; Horibe, Hideo</creatorcontrib><description>Resist stripping phenomenon with laser irradiation was observed by using a time-resolved analysis. The time change of the resist stripping phenomenon by a probe laser irradiation was observed from the viewpoint of the intensity change of the probe laser. As for the laser irradiation in the water, the probe laser intensity arrived at the maximum after around 40 μs. During the pump laser irradiation of 8 ns, a large compressive stress of -10 MPa was confirmed inside the resist from the FE analysis results. The generation of this compression stress is important for starting the resist stripping process, and is thought to improve the resist removal efficiency.</description><identifier>ISSN: 0914-9244</identifier><identifier>EISSN: 1349-6336</identifier><identifier>DOI: 10.2494/photopolymer.31.413</identifier><language>eng</language><publisher>Hiratsuka: The Society of Photopolymer Science and Technology(SPST)</publisher><subject>Compressive properties ; Compressive stress ; Electrons ; Finite element (FE) method ; Ions ; Irradiation ; Lasers ; Pump laser irradiation ; Removal efficiency ; Resist stripping phenomenon ; Stripping ; Time-resolved analysis</subject><ispartof>Journal of Photopolymer Science and Technology, 2018/06/25, Vol.31(3), pp.413-418</ispartof><rights>2018 The Society of Photopolymer Science and Technology (SPST)</rights><rights>Copyright Japan Science and Technology Agency 2018</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c572t-3d7d219079006b784cde7aabdb63457a2b855cc626f90fb728cf4b3033416fc03</citedby><cites>FETCH-LOGICAL-c572t-3d7d219079006b784cde7aabdb63457a2b855cc626f90fb728cf4b3033416fc03</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,1883,27924,27925</link.rule.ids></links><search><creatorcontrib>Kamimura, Tomosumi</creatorcontrib><creatorcontrib>Umeda, Yuji</creatorcontrib><creatorcontrib>Kuramae, Hiroyuki</creatorcontrib><creatorcontrib>Nuno, Kosuke</creatorcontrib><creatorcontrib>Nakamura, Ryosuke</creatorcontrib><creatorcontrib>Horibe, Hideo</creatorcontrib><title>Time-resolved Analysis of Resist Stripping Phenomenon Using Laser Irradiation</title><title>Journal of Photopolymer Science and Technology</title><addtitle>J. Photopol. Sci. Technol.</addtitle><description>Resist stripping phenomenon with laser irradiation was observed by using a time-resolved analysis. The time change of the resist stripping phenomenon by a probe laser irradiation was observed from the viewpoint of the intensity change of the probe laser. As for the laser irradiation in the water, the probe laser intensity arrived at the maximum after around 40 μs. During the pump laser irradiation of 8 ns, a large compressive stress of -10 MPa was confirmed inside the resist from the FE analysis results. The generation of this compression stress is important for starting the resist stripping process, and is thought to improve the resist removal efficiency.</description><subject>Compressive properties</subject><subject>Compressive stress</subject><subject>Electrons</subject><subject>Finite element (FE) method</subject><subject>Ions</subject><subject>Irradiation</subject><subject>Lasers</subject><subject>Pump laser irradiation</subject><subject>Removal efficiency</subject><subject>Resist stripping phenomenon</subject><subject>Stripping</subject><subject>Time-resolved analysis</subject><issn>0914-9244</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNplkFFLwzAUhYMoOKe_wJeCz51JbtI0j2M4HUwU3Z5DmqZbRtvUpBP27-3YEMGHy70cznc5HITuCZ5QJtljt_W973x9aGyYAJkwAhdoRIDJNAPILtEIS8JSSRm7Rjcx7jAG4FyO0OvKNTYNNvr625bJtNX1IbqY-Cr5sMPRJ599cF3n2k3yvrWtb4Zpk3U8CksdbUgWIejS6d759hZdVbqO9u68x2g9f1rNXtLl2_NiNl2mhgvap1CKkhKJhcQ4K0TOTGmF1kVZZMC40LTIOTcmo1klcVUImpuKFTBkZiSrDIYxejj97YL_2tvYq53fhyF7VJQC5blkgg8uOLlM8DEGW6kuuEaHgyJYHXtTf3tTQNTQ20DNT9Qu9npjfxkdemdq-4-BM_hrMFsdlG3hBzS0f5w</recordid><startdate>20180625</startdate><enddate>20180625</enddate><creator>Kamimura, Tomosumi</creator><creator>Umeda, Yuji</creator><creator>Kuramae, Hiroyuki</creator><creator>Nuno, Kosuke</creator><creator>Nakamura, Ryosuke</creator><creator>Horibe, Hideo</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20180625</creationdate><title>Time-resolved Analysis of Resist Stripping Phenomenon Using Laser Irradiation</title><author>Kamimura, Tomosumi ; Umeda, Yuji ; Kuramae, Hiroyuki ; Nuno, Kosuke ; Nakamura, Ryosuke ; Horibe, Hideo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c572t-3d7d219079006b784cde7aabdb63457a2b855cc626f90fb728cf4b3033416fc03</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>Compressive properties</topic><topic>Compressive stress</topic><topic>Electrons</topic><topic>Finite element (FE) method</topic><topic>Ions</topic><topic>Irradiation</topic><topic>Lasers</topic><topic>Pump laser irradiation</topic><topic>Removal efficiency</topic><topic>Resist stripping phenomenon</topic><topic>Stripping</topic><topic>Time-resolved analysis</topic><toplevel>online_resources</toplevel><creatorcontrib>Kamimura, Tomosumi</creatorcontrib><creatorcontrib>Umeda, Yuji</creatorcontrib><creatorcontrib>Kuramae, Hiroyuki</creatorcontrib><creatorcontrib>Nuno, Kosuke</creatorcontrib><creatorcontrib>Nakamura, Ryosuke</creatorcontrib><creatorcontrib>Horibe, Hideo</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kamimura, Tomosumi</au><au>Umeda, Yuji</au><au>Kuramae, Hiroyuki</au><au>Nuno, Kosuke</au><au>Nakamura, Ryosuke</au><au>Horibe, Hideo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Time-resolved Analysis of Resist Stripping Phenomenon Using Laser Irradiation</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2018-06-25</date><risdate>2018</risdate><volume>31</volume><issue>3</issue><spage>413</spage><epage>418</epage><pages>413-418</pages><issn>0914-9244</issn><eissn>1349-6336</eissn><abstract>Resist stripping phenomenon with laser irradiation was observed by using a time-resolved analysis. The time change of the resist stripping phenomenon by a probe laser irradiation was observed from the viewpoint of the intensity change of the probe laser. As for the laser irradiation in the water, the probe laser intensity arrived at the maximum after around 40 μs. During the pump laser irradiation of 8 ns, a large compressive stress of -10 MPa was confirmed inside the resist from the FE analysis results. The generation of this compression stress is important for starting the resist stripping process, and is thought to improve the resist removal efficiency.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.31.413</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record> |
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source | J-STAGE (Japan Science & Technology Information Aggregator, Electronic) Freely Available Titles - Japanese; EZB-FREE-00999 freely available EZB journals; Free Full-Text Journals in Chemistry |
subjects | Compressive properties Compressive stress Electrons Finite element (FE) method Ions Irradiation Lasers Pump laser irradiation Removal efficiency Resist stripping phenomenon Stripping Time-resolved analysis |
title | Time-resolved Analysis of Resist Stripping Phenomenon Using Laser Irradiation |
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