Reduction of Defect for Imprinted UV Curable Resin including Volatile Solvents using Gas Permeable Mold Derived from Cellulose

Nanoimprint lithography has recently attracted much attention in microfabrication technology due to its two benefits of high resolving power and decreased production cost. It is promising for the next generation microfabrication technology. However, voids generated between the master mold and transf...

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Veröffentlicht in:Journal of Photopolymer Science and Technology 2018/06/25, Vol.31(2), pp.289-294
Hauptverfasser: Mizui, Kento, Kurematsu, Kazuho, Nakajima, Shinya, Hanabata, Makoto, Takei, Satoshi
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container_end_page 294
container_issue 2
container_start_page 289
container_title Journal of Photopolymer Science and Technology
container_volume 31
creator Mizui, Kento
Kurematsu, Kazuho
Nakajima, Shinya
Hanabata, Makoto
Takei, Satoshi
description Nanoimprint lithography has recently attracted much attention in microfabrication technology due to its two benefits of high resolving power and decreased production cost. It is promising for the next generation microfabrication technology. However, voids generated between the master mold and transferred replica mold are one of the problems for nanoimprint lithography. We have been developing gas permeable molds derived from cellulose to reduce defects caused from these voids. This study demonstrates the applicability of gas permeable mold. Defects in line and space patterns of the UV-cross-linkable materials including 10 wt% of acetone, 10 wt% of 1-methoxy-2-propyl acetate (PGMEA) and 10 wt% of cyclopentane as volatile solvents were greatly eliminated by using a gas permeable mold. This approach is expected to expand the utility of non-liquid materials which need solvents that are currently not suitable for nanoimprint lithography.
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2232582552</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2232582552</sourcerecordid><originalsourceid>FETCH-LOGICAL-c572t-89e52ae1a2450fbefe7c23cad7538c76d59c7ad5822245bdd6c65547c62b8f4e3</originalsourceid><addsrcrecordid>eNplkMtKxDAUhoMoOI4-gZuA645tLr0spd4GRpTxsg1pcqod0mZM0gE3PrsZR0RwFTj5vv8cfoROs3RGWMXO12822LU1Hz24Gc1mpKz20CSjrEpySvN9NEmrjCUVYewQHXm_SlNKOa8m6HMJelShswO2Lb6EFlTArXV43q9dNwTQ-PkF16OTjQG8BN8NuBuUGXU3vOIXa2To4sejNRsYgsej385vpMcP4Hr4tu6s0THadZuY1jrb4xqMGY31cIwOWmk8nPy8U_R8ffVU3yaL-5t5fbFIFC9ISMoKOJGQScJ42jbxykIRqqQuOC1VkWteqUJqXhISiUbrXOWcs0LlpClbBnSKzna5a2ffR_BBrOzohrhSEEJJFDknkaI7SjnrvYNWxA566T5Elopt0eJv0YJmIhYdreudtfJBvsKvI13olIH_zo_4C6g36QQM9Av3x5Gq</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2232582552</pqid></control><display><type>article</type><title>Reduction of Defect for Imprinted UV Curable Resin including Volatile Solvents using Gas Permeable Mold Derived from Cellulose</title><source>J-STAGE Free</source><source>Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals</source><source>Free Full-Text Journals in Chemistry</source><creator>Mizui, Kento ; Kurematsu, Kazuho ; Nakajima, Shinya ; Hanabata, Makoto ; Takei, Satoshi</creator><creatorcontrib>Mizui, Kento ; Kurematsu, Kazuho ; Nakajima, Shinya ; Hanabata, Makoto ; Takei, Satoshi</creatorcontrib><description>Nanoimprint lithography has recently attracted much attention in microfabrication technology due to its two benefits of high resolving power and decreased production cost. It is promising for the next generation microfabrication technology. However, voids generated between the master mold and transferred replica mold are one of the problems for nanoimprint lithography. We have been developing gas permeable molds derived from cellulose to reduce defects caused from these voids. This study demonstrates the applicability of gas permeable mold. Defects in line and space patterns of the UV-cross-linkable materials including 10 wt% of acetone, 10 wt% of 1-methoxy-2-propyl acetate (PGMEA) and 10 wt% of cyclopentane as volatile solvents were greatly eliminated by using a gas permeable mold. This approach is expected to expand the utility of non-liquid materials which need solvents that are currently not suitable for nanoimprint lithography.</description><identifier>ISSN: 0914-9244</identifier><identifier>EISSN: 1349-6336</identifier><identifier>DOI: 10.2494/photopolymer.31.289</identifier><language>eng</language><publisher>Hiratsuka: The Society of Photopolymer Science and Technology(SPST)</publisher><subject>Acetone ; Biomass ; Cellulose ; Cellulosic resins ; Crosslinking ; Defects ; Gas permeability ; Lithography ; Mass production ; Molds ; Nanoimprint lithography ; Nanotechnology ; Permeability ; Production costs ; Raman spectra ; Resolution ; Solvents ; Volatile solvent</subject><ispartof>Journal of Photopolymer Science and Technology, 2018/06/25, Vol.31(2), pp.289-294</ispartof><rights>2018 The Society of Photopolymer Science and Technology (SPST)</rights><rights>Copyright Japan Science and Technology Agency 2018</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c572t-89e52ae1a2450fbefe7c23cad7538c76d59c7ad5822245bdd6c65547c62b8f4e3</citedby><cites>FETCH-LOGICAL-c572t-89e52ae1a2450fbefe7c23cad7538c76d59c7ad5822245bdd6c65547c62b8f4e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>315,781,785,1884,27926,27927</link.rule.ids></links><search><creatorcontrib>Mizui, Kento</creatorcontrib><creatorcontrib>Kurematsu, Kazuho</creatorcontrib><creatorcontrib>Nakajima, Shinya</creatorcontrib><creatorcontrib>Hanabata, Makoto</creatorcontrib><creatorcontrib>Takei, Satoshi</creatorcontrib><title>Reduction of Defect for Imprinted UV Curable Resin including Volatile Solvents using Gas Permeable Mold Derived from Cellulose</title><title>Journal of Photopolymer Science and Technology</title><addtitle>J. Photopol. Sci. Technol.</addtitle><description>Nanoimprint lithography has recently attracted much attention in microfabrication technology due to its two benefits of high resolving power and decreased production cost. It is promising for the next generation microfabrication technology. However, voids generated between the master mold and transferred replica mold are one of the problems for nanoimprint lithography. We have been developing gas permeable molds derived from cellulose to reduce defects caused from these voids. This study demonstrates the applicability of gas permeable mold. Defects in line and space patterns of the UV-cross-linkable materials including 10 wt% of acetone, 10 wt% of 1-methoxy-2-propyl acetate (PGMEA) and 10 wt% of cyclopentane as volatile solvents were greatly eliminated by using a gas permeable mold. This approach is expected to expand the utility of non-liquid materials which need solvents that are currently not suitable for nanoimprint lithography.</description><subject>Acetone</subject><subject>Biomass</subject><subject>Cellulose</subject><subject>Cellulosic resins</subject><subject>Crosslinking</subject><subject>Defects</subject><subject>Gas permeability</subject><subject>Lithography</subject><subject>Mass production</subject><subject>Molds</subject><subject>Nanoimprint lithography</subject><subject>Nanotechnology</subject><subject>Permeability</subject><subject>Production costs</subject><subject>Raman spectra</subject><subject>Resolution</subject><subject>Solvents</subject><subject>Volatile solvent</subject><issn>0914-9244</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNplkMtKxDAUhoMoOI4-gZuA645tLr0spd4GRpTxsg1pcqod0mZM0gE3PrsZR0RwFTj5vv8cfoROs3RGWMXO12822LU1Hz24Gc1mpKz20CSjrEpySvN9NEmrjCUVYewQHXm_SlNKOa8m6HMJelShswO2Lb6EFlTArXV43q9dNwTQ-PkF16OTjQG8BN8NuBuUGXU3vOIXa2To4sejNRsYgsej385vpMcP4Hr4tu6s0THadZuY1jrb4xqMGY31cIwOWmk8nPy8U_R8ffVU3yaL-5t5fbFIFC9ISMoKOJGQScJ42jbxykIRqqQuOC1VkWteqUJqXhISiUbrXOWcs0LlpClbBnSKzna5a2ffR_BBrOzohrhSEEJJFDknkaI7SjnrvYNWxA566T5Elopt0eJv0YJmIhYdreudtfJBvsKvI13olIH_zo_4C6g36QQM9Av3x5Gq</recordid><startdate>20180625</startdate><enddate>20180625</enddate><creator>Mizui, Kento</creator><creator>Kurematsu, Kazuho</creator><creator>Nakajima, Shinya</creator><creator>Hanabata, Makoto</creator><creator>Takei, Satoshi</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20180625</creationdate><title>Reduction of Defect for Imprinted UV Curable Resin including Volatile Solvents using Gas Permeable Mold Derived from Cellulose</title><author>Mizui, Kento ; Kurematsu, Kazuho ; Nakajima, Shinya ; Hanabata, Makoto ; Takei, Satoshi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c572t-89e52ae1a2450fbefe7c23cad7538c76d59c7ad5822245bdd6c65547c62b8f4e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>Acetone</topic><topic>Biomass</topic><topic>Cellulose</topic><topic>Cellulosic resins</topic><topic>Crosslinking</topic><topic>Defects</topic><topic>Gas permeability</topic><topic>Lithography</topic><topic>Mass production</topic><topic>Molds</topic><topic>Nanoimprint lithography</topic><topic>Nanotechnology</topic><topic>Permeability</topic><topic>Production costs</topic><topic>Raman spectra</topic><topic>Resolution</topic><topic>Solvents</topic><topic>Volatile solvent</topic><toplevel>online_resources</toplevel><creatorcontrib>Mizui, Kento</creatorcontrib><creatorcontrib>Kurematsu, Kazuho</creatorcontrib><creatorcontrib>Nakajima, Shinya</creatorcontrib><creatorcontrib>Hanabata, Makoto</creatorcontrib><creatorcontrib>Takei, Satoshi</creatorcontrib><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Mizui, Kento</au><au>Kurematsu, Kazuho</au><au>Nakajima, Shinya</au><au>Hanabata, Makoto</au><au>Takei, Satoshi</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Reduction of Defect for Imprinted UV Curable Resin including Volatile Solvents using Gas Permeable Mold Derived from Cellulose</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2018-06-25</date><risdate>2018</risdate><volume>31</volume><issue>2</issue><spage>289</spage><epage>294</epage><pages>289-294</pages><issn>0914-9244</issn><eissn>1349-6336</eissn><abstract>Nanoimprint lithography has recently attracted much attention in microfabrication technology due to its two benefits of high resolving power and decreased production cost. It is promising for the next generation microfabrication technology. However, voids generated between the master mold and transferred replica mold are one of the problems for nanoimprint lithography. We have been developing gas permeable molds derived from cellulose to reduce defects caused from these voids. This study demonstrates the applicability of gas permeable mold. Defects in line and space patterns of the UV-cross-linkable materials including 10 wt% of acetone, 10 wt% of 1-methoxy-2-propyl acetate (PGMEA) and 10 wt% of cyclopentane as volatile solvents were greatly eliminated by using a gas permeable mold. This approach is expected to expand the utility of non-liquid materials which need solvents that are currently not suitable for nanoimprint lithography.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.31.289</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record>
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1349-6336
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subjects Acetone
Biomass
Cellulose
Cellulosic resins
Crosslinking
Defects
Gas permeability
Lithography
Mass production
Molds
Nanoimprint lithography
Nanotechnology
Permeability
Production costs
Raman spectra
Resolution
Solvents
Volatile solvent
title Reduction of Defect for Imprinted UV Curable Resin including Volatile Solvents using Gas Permeable Mold Derived from Cellulose
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-18T08%3A06%3A19IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Reduction%20of%20Defect%20for%20Imprinted%20UV%20Curable%20Resin%20including%20Volatile%20Solvents%20using%20Gas%20Permeable%20Mold%20Derived%20from%20Cellulose&rft.jtitle=Journal%20of%20Photopolymer%20Science%20and%20Technology&rft.au=Mizui,%20Kento&rft.date=2018-06-25&rft.volume=31&rft.issue=2&rft.spage=289&rft.epage=294&rft.pages=289-294&rft.issn=0914-9244&rft.eissn=1349-6336&rft_id=info:doi/10.2494/photopolymer.31.289&rft_dat=%3Cproquest_cross%3E2232582552%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2232582552&rft_id=info:pmid/&rfr_iscdi=true