Mathematical Modeling of Droplet Formation, Evaporation, and Film Growth to Study Crystallite Size and Film Thickness of Spray Pyrolysis Deposited TiO2 Thin Films
The pure TiO2 thin films were successfully deposited onto a glass substrate by using modified spray pyrolysis system. The TiO2 thin films were deposited at temperature 350°C using Titanium trichloride precursor solutions of concentration 0.075 M, 0.1 M, and 0.125 M. Also, TiO2 thin films with precur...
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| Veröffentlicht in: | E-journal of surface science and nanotechnology 2018/10/25, Vol.16, pp.419-426 |
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| creator | Gapale, Dipak L. Arote, Sandeep A. Borse, Ratan Y. |
| description | The pure TiO2 thin films were successfully deposited onto a glass substrate by using modified spray pyrolysis system. The TiO2 thin films were deposited at temperature 350°C using Titanium trichloride precursor solutions of concentration 0.075 M, 0.1 M, and 0.125 M. Also, TiO2 thin films with precursor solutions of concentration 0.1 M were deposited at different deposition temperature 350°C, 400°C, and 450°C. The prepared samples were further annealed at 500°C for 2 h to improve crystallinity. The XRD study revealed that the deposited TiO2 thin films were polycrystalline and showed anatase phase with pre-dominant (101) peak. The crystallite size calculated from XRD was found to increase with increase in precursor solution concentration. The mathematical model to calculate crystallite size and film thickness were developed and the predicted results were compared with experimental results. The experimentally calculated crystallite size and thickness was in good agreement with the predicted results. The details of mathematical model and calculations TiO2 thin films for were discussed in detail. [DOI: 10.1380/ejssnt.2018.419] |
| doi_str_mv | 10.1380/ejssnt.2018.419 |
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[DOI: 10.1380/ejssnt.2018.419]</description><identifier>ISSN: 1348-0391</identifier><identifier>EISSN: 1348-0391</identifier><identifier>DOI: 10.1380/ejssnt.2018.419</identifier><language>eng ; jpn</language><publisher>Tokyo: The Japan Society of Vacuum and Surface Science</publisher><subject>Anatase ; Chlorides ; Crystallites ; Crystallization ; Film growth ; Film thickness ; Glass substrates ; Growth ; Liquid phase epitaxy ; Mathematical models ; Precursors ; Semiconducting films ; Spray pyrolysis ; Thermal energy ; Thin films ; Titanium dioxide ; Titanium oxide ; X-ray diffraction</subject><ispartof>e-Journal of Surface Science and Nanotechnology, 2018/10/25, Vol.16, pp.419-426</ispartof><rights>2018 The Japan Society of Vacuum and Surface Science</rights><rights>Copyright Japan Science and Technology Agency 2018</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c379t-c321bd39b9ec3fbf3b62eb1a8956c4fe73f4f85d3df2af5d61d072b81f0714043</citedby><cites>FETCH-LOGICAL-c379t-c321bd39b9ec3fbf3b62eb1a8956c4fe73f4f85d3df2af5d61d072b81f0714043</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,860,1877,27901,27902</link.rule.ids></links><search><creatorcontrib>Gapale, Dipak L.</creatorcontrib><creatorcontrib>Arote, Sandeep A.</creatorcontrib><creatorcontrib>Borse, Ratan Y.</creatorcontrib><title>Mathematical Modeling of Droplet Formation, Evaporation, and Film Growth to Study Crystallite Size and Film Thickness of Spray Pyrolysis Deposited TiO2 Thin Films</title><title>E-journal of surface science and nanotechnology</title><addtitle>e-J. Surf. Sci. Nanotechnol.</addtitle><description>The pure TiO2 thin films were successfully deposited onto a glass substrate by using modified spray pyrolysis system. The TiO2 thin films were deposited at temperature 350°C using Titanium trichloride precursor solutions of concentration 0.075 M, 0.1 M, and 0.125 M. Also, TiO2 thin films with precursor solutions of concentration 0.1 M were deposited at different deposition temperature 350°C, 400°C, and 450°C. The prepared samples were further annealed at 500°C for 2 h to improve crystallinity. The XRD study revealed that the deposited TiO2 thin films were polycrystalline and showed anatase phase with pre-dominant (101) peak. The crystallite size calculated from XRD was found to increase with increase in precursor solution concentration. The mathematical model to calculate crystallite size and film thickness were developed and the predicted results were compared with experimental results. The experimentally calculated crystallite size and thickness was in good agreement with the predicted results. The details of mathematical model and calculations TiO2 thin films for were discussed in detail. [DOI: 10.1380/ejssnt.2018.419]</description><subject>Anatase</subject><subject>Chlorides</subject><subject>Crystallites</subject><subject>Crystallization</subject><subject>Film growth</subject><subject>Film thickness</subject><subject>Glass substrates</subject><subject>Growth</subject><subject>Liquid phase epitaxy</subject><subject>Mathematical models</subject><subject>Precursors</subject><subject>Semiconducting films</subject><subject>Spray pyrolysis</subject><subject>Thermal energy</subject><subject>Thin films</subject><subject>Titanium dioxide</subject><subject>Titanium oxide</subject><subject>X-ray diffraction</subject><issn>1348-0391</issn><issn>1348-0391</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNpNkctOAyEUhidGE69rtyRubYVhrjtNbdVEU5PWNWGGg6XSYQSqGR_HJ5Wx9bI5QM73HZLzR9EpwUNCC3wBS-caP4wxKYYJKXeiA0KTYoBpSXb_3fejQ-eWGNOc5tlB9PnA_QJW3Kuaa_RgBGjVPCMj0bU1rQaPJsb2bdOco_Ebb43dPngj0ETpFbqx5t0vkDdo5teiQyPbOc-1Vh7QTH3AHzlfqPqlAef6-bPW8g49dtbozimHrqE1LjgCzdU07tnm23LH0Z7k2sHJ9jyKnibj-eh2cD-9uRtd3Q9qmpc-1JhUgpZVCTWVlaRVFkNFeFGmWZ1IyKlMZJEKKmTMZSoyInAeVwWROCcJTuhRdLaZ21rzugbn2dKsbRO-ZHFMSYGLNCWButhQtTXOWZCstWrFbccIZn0QbBME64NgIYhgXG6MZVjLM_zy3Iala_jhScZwX4Ly26oX3DJo6Bexy5eI</recordid><startdate>20181025</startdate><enddate>20181025</enddate><creator>Gapale, Dipak L.</creator><creator>Arote, Sandeep A.</creator><creator>Borse, Ratan Y.</creator><general>The Japan Society of Vacuum and Surface Science</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20181025</creationdate><title>Mathematical Modeling of Droplet Formation, Evaporation, and Film Growth to Study Crystallite Size and Film Thickness of Spray Pyrolysis Deposited TiO2 Thin Films</title><author>Gapale, Dipak L. ; Arote, Sandeep A. ; Borse, Ratan Y.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c379t-c321bd39b9ec3fbf3b62eb1a8956c4fe73f4f85d3df2af5d61d072b81f0714043</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng ; jpn</language><creationdate>2018</creationdate><topic>Anatase</topic><topic>Chlorides</topic><topic>Crystallites</topic><topic>Crystallization</topic><topic>Film growth</topic><topic>Film thickness</topic><topic>Glass substrates</topic><topic>Growth</topic><topic>Liquid phase epitaxy</topic><topic>Mathematical models</topic><topic>Precursors</topic><topic>Semiconducting films</topic><topic>Spray pyrolysis</topic><topic>Thermal energy</topic><topic>Thin films</topic><topic>Titanium dioxide</topic><topic>Titanium oxide</topic><topic>X-ray diffraction</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Gapale, Dipak L.</creatorcontrib><creatorcontrib>Arote, Sandeep A.</creatorcontrib><creatorcontrib>Borse, Ratan Y.</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>E-journal of surface science and nanotechnology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Gapale, Dipak L.</au><au>Arote, Sandeep A.</au><au>Borse, Ratan Y.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Mathematical Modeling of Droplet Formation, Evaporation, and Film Growth to Study Crystallite Size and Film Thickness of Spray Pyrolysis Deposited TiO2 Thin Films</atitle><jtitle>E-journal of surface science and nanotechnology</jtitle><addtitle>e-J. Surf. Sci. Nanotechnol.</addtitle><date>2018-10-25</date><risdate>2018</risdate><volume>16</volume><spage>419</spage><epage>426</epage><pages>419-426</pages><issn>1348-0391</issn><eissn>1348-0391</eissn><abstract>The pure TiO2 thin films were successfully deposited onto a glass substrate by using modified spray pyrolysis system. The TiO2 thin films were deposited at temperature 350°C using Titanium trichloride precursor solutions of concentration 0.075 M, 0.1 M, and 0.125 M. Also, TiO2 thin films with precursor solutions of concentration 0.1 M were deposited at different deposition temperature 350°C, 400°C, and 450°C. The prepared samples were further annealed at 500°C for 2 h to improve crystallinity. The XRD study revealed that the deposited TiO2 thin films were polycrystalline and showed anatase phase with pre-dominant (101) peak. The crystallite size calculated from XRD was found to increase with increase in precursor solution concentration. The mathematical model to calculate crystallite size and film thickness were developed and the predicted results were compared with experimental results. The experimentally calculated crystallite size and thickness was in good agreement with the predicted results. The details of mathematical model and calculations TiO2 thin films for were discussed in detail. [DOI: 10.1380/ejssnt.2018.419]</abstract><cop>Tokyo</cop><pub>The Japan Society of Vacuum and Surface Science</pub><doi>10.1380/ejssnt.2018.419</doi><tpages>8</tpages><oa>free_for_read</oa></addata></record> |
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| subjects | Anatase Chlorides Crystallites Crystallization Film growth Film thickness Glass substrates Growth Liquid phase epitaxy Mathematical models Precursors Semiconducting films Spray pyrolysis Thermal energy Thin films Titanium dioxide Titanium oxide X-ray diffraction |
| title | Mathematical Modeling of Droplet Formation, Evaporation, and Film Growth to Study Crystallite Size and Film Thickness of Spray Pyrolysis Deposited TiO2 Thin Films |
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