Carbon nanotubes by plasma-enhanced chemical vapor deposition

This paper presents the growth of vertically aligned carbon nanotubes by plasma-enhanced chemical vapor deposition (PECVD) using Ni catalyst and C /NH feedstock. The role of plasma in aligning the carbon nanotubes during growth is investigated both experimentally and computationally, confirming that...

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Veröffentlicht in:	Pure and applied chemistry 2006-06, Vol.78 (6), p.1117-1125
Hauptverfasser:	Bell, Martin S., Teo, Kenneth B. K., Lacerda, Rodrigo G., Milne, W. I., Hash, David B., Meyyappan, M.
Format:	Artikel
Sprache:	eng
Schlagworte:	Alignment Ammonia Carbon Carbon nanotubes Chemical vapor deposition Computer simulation Endothermic reactions glow discharge nanotubes Organic chemistry PECVD Plasma Plasma chemistry Plasma enhanced chemical vapor deposition Plasma sheaths Raw materials Vapor phases
Online-Zugang:	Volltext
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