Electron dynamics of low-pressure deposition plasma
When the electric field in the dark gas phase reaches the threshold value, an electron avalanche (breakdown) occurs, which causes dissociation of organic molecules, excitation of chemically reactive molecular gas, and/or ionization of atomic gas, depending on the type of gas involved. The principles...
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Veröffentlicht in: | Pure and applied chemistry 2008-09, Vol.80 (9), p.1883-1892 |
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creator | Yasuda, Hirotsugu Ledernez, Loic Olcaytug, Fethi Urban, Gerald |
description | When the electric field in the dark gas phase reaches the threshold value, an electron avalanche (breakdown) occurs, which causes dissociation of organic molecules, excitation of chemically reactive molecular gas, and/or ionization of atomic gas, depending on the type of gas involved. The principles that govern these electron-impact reactions are collectively described by the term "electron dynamics". The electron-impact dissociation of organic molecules is the key factor for the deposition plasma. The implications of the interfacial avalanche of the primary electrons on the deposition plasma and also other plasma processes are discussed. The system dependency of low-pressure plasma deposition processes is an extremely important factor that should be reckoned, because the electron dynamic reactions are highly dependent on every aspect of the reaction system. The secondary electron emission from the cathode is a misinterpretation of the interfacial electron avalanche of the primary electrons described in this paper. |
doi_str_mv | 10.1351/pac200880091883 |
format | Article |
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The principles that govern these electron-impact reactions are collectively described by the term "electron dynamics". The electron-impact dissociation of organic molecules is the key factor for the deposition plasma. The implications of the interfacial avalanche of the primary electrons on the deposition plasma and also other plasma processes are discussed. The system dependency of low-pressure plasma deposition processes is an extremely important factor that should be reckoned, because the electron dynamic reactions are highly dependent on every aspect of the reaction system. The secondary electron emission from the cathode is a misinterpretation of the interfacial electron avalanche of the primary electrons described in this paper.</description><identifier>ISSN: 0033-4545</identifier><identifier>EISSN: 1365-3075</identifier><identifier>DOI: 10.1351/pac200880091883</identifier><language>eng</language><publisher>Berlin: De Gruyter</publisher><subject>breakdown process ; Electric fields ; Electron avalanche ; electron dynamics ; Electron emission ; Electrons ; Ionization ; Low pressure ; magnetron plasma polymerization ; Molecular gases ; Organic chemistry ; Plasma deposition ; plasma polymerization ; Pressure dependence ; primary-electron emission ; Vapor phases</subject><ispartof>Pure and applied chemistry, 2008-09, Vol.80 (9), p.1883-1892</ispartof><rights>2013 Walter de Gruyter GmbH, Berlin/Boston</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c365t-27796364e29050dde87f42d450fa7095c70a86499f3646c892a4c1f2e180f79e3</citedby><cites>FETCH-LOGICAL-c365t-27796364e29050dde87f42d450fa7095c70a86499f3646c892a4c1f2e180f79e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>Yasuda, Hirotsugu</creatorcontrib><creatorcontrib>Ledernez, Loic</creatorcontrib><creatorcontrib>Olcaytug, Fethi</creatorcontrib><creatorcontrib>Urban, Gerald</creatorcontrib><title>Electron dynamics of low-pressure deposition plasma</title><title>Pure and applied chemistry</title><description>When the electric field in the dark gas phase reaches the threshold value, an electron avalanche (breakdown) occurs, which causes dissociation of organic molecules, excitation of chemically reactive molecular gas, and/or ionization of atomic gas, depending on the type of gas involved. The principles that govern these electron-impact reactions are collectively described by the term "electron dynamics". The electron-impact dissociation of organic molecules is the key factor for the deposition plasma. The implications of the interfacial avalanche of the primary electrons on the deposition plasma and also other plasma processes are discussed. The system dependency of low-pressure plasma deposition processes is an extremely important factor that should be reckoned, because the electron dynamic reactions are highly dependent on every aspect of the reaction system. The secondary electron emission from the cathode is a misinterpretation of the interfacial electron avalanche of the primary electrons described in this paper.</description><subject>breakdown process</subject><subject>Electric fields</subject><subject>Electron avalanche</subject><subject>electron dynamics</subject><subject>Electron emission</subject><subject>Electrons</subject><subject>Ionization</subject><subject>Low pressure</subject><subject>magnetron plasma polymerization</subject><subject>Molecular gases</subject><subject>Organic chemistry</subject><subject>Plasma deposition</subject><subject>plasma polymerization</subject><subject>Pressure dependence</subject><subject>primary-electron emission</subject><subject>Vapor phases</subject><issn>0033-4545</issn><issn>1365-3075</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNp1kM1LxDAUxIMouK6evRY81335apKLIMv6AQte9FxC-iJd2k1NWpb-90Z2QRA8vTn8ZoY3hNxSuKdc0tVgHQPQGsBQrfkZWVBeyZKDkudkAcB5KaSQl-QqpR0ACCPYgvBNh26MYV808972rUtF8EUXDuUQMaUpYtHgEFI7tpkZOpt6e00uvO0S3pzuknw8bd7XL-X27fl1_bgtXS4eS6aUqXglkBmQ0DSolResERK8VWCkU2B1JYzxGaqcNswKRz1DqsErg3xJ7o65QwxfE6ax3oUp7nNlzRgzRudnWaZWR8rFkFJEXw-x7W2cawr1zzL1n2Wy4-HoONhuxNjgZ5zmLH7j_3HqU8A3RQdofA</recordid><startdate>20080901</startdate><enddate>20080901</enddate><creator>Yasuda, Hirotsugu</creator><creator>Ledernez, Loic</creator><creator>Olcaytug, Fethi</creator><creator>Urban, Gerald</creator><general>De Gruyter</general><general>Walter de Gruyter GmbH</general><scope>AAYXX</scope><scope>CITATION</scope><scope>K9.</scope></search><sort><creationdate>20080901</creationdate><title>Electron dynamics of low-pressure deposition plasma</title><author>Yasuda, Hirotsugu ; Ledernez, Loic ; Olcaytug, Fethi ; Urban, Gerald</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c365t-27796364e29050dde87f42d450fa7095c70a86499f3646c892a4c1f2e180f79e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><topic>breakdown process</topic><topic>Electric fields</topic><topic>Electron avalanche</topic><topic>electron dynamics</topic><topic>Electron emission</topic><topic>Electrons</topic><topic>Ionization</topic><topic>Low pressure</topic><topic>magnetron plasma polymerization</topic><topic>Molecular gases</topic><topic>Organic chemistry</topic><topic>Plasma deposition</topic><topic>plasma polymerization</topic><topic>Pressure dependence</topic><topic>primary-electron emission</topic><topic>Vapor phases</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yasuda, Hirotsugu</creatorcontrib><creatorcontrib>Ledernez, Loic</creatorcontrib><creatorcontrib>Olcaytug, Fethi</creatorcontrib><creatorcontrib>Urban, Gerald</creatorcontrib><collection>CrossRef</collection><collection>ProQuest Health & Medical Complete (Alumni)</collection><jtitle>Pure and applied chemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yasuda, Hirotsugu</au><au>Ledernez, Loic</au><au>Olcaytug, Fethi</au><au>Urban, Gerald</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electron dynamics of low-pressure deposition plasma</atitle><jtitle>Pure and applied chemistry</jtitle><date>2008-09-01</date><risdate>2008</risdate><volume>80</volume><issue>9</issue><spage>1883</spage><epage>1892</epage><pages>1883-1892</pages><issn>0033-4545</issn><eissn>1365-3075</eissn><abstract>When the electric field in the dark gas phase reaches the threshold value, an electron avalanche (breakdown) occurs, which causes dissociation of organic molecules, excitation of chemically reactive molecular gas, and/or ionization of atomic gas, depending on the type of gas involved. The principles that govern these electron-impact reactions are collectively described by the term "electron dynamics". The electron-impact dissociation of organic molecules is the key factor for the deposition plasma. The implications of the interfacial avalanche of the primary electrons on the deposition plasma and also other plasma processes are discussed. The system dependency of low-pressure plasma deposition processes is an extremely important factor that should be reckoned, because the electron dynamic reactions are highly dependent on every aspect of the reaction system. The secondary electron emission from the cathode is a misinterpretation of the interfacial electron avalanche of the primary electrons described in this paper.</abstract><cop>Berlin</cop><pub>De Gruyter</pub><doi>10.1351/pac200880091883</doi><tpages>10</tpages><oa>free_for_read</oa></addata></record> |
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subjects | breakdown process Electric fields Electron avalanche electron dynamics Electron emission Electrons Ionization Low pressure magnetron plasma polymerization Molecular gases Organic chemistry Plasma deposition plasma polymerization Pressure dependence primary-electron emission Vapor phases |
title | Electron dynamics of low-pressure deposition plasma |
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