Electron dynamics of low-pressure deposition plasma

When the electric field in the dark gas phase reaches the threshold value, an electron avalanche (breakdown) occurs, which causes dissociation of organic molecules, excitation of chemically reactive molecular gas, and/or ionization of atomic gas, depending on the type of gas involved. The principles...

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Veröffentlicht in:Pure and applied chemistry 2008-09, Vol.80 (9), p.1883-1892
Hauptverfasser: Yasuda, Hirotsugu, Ledernez, Loic, Olcaytug, Fethi, Urban, Gerald
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container_issue 9
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container_title Pure and applied chemistry
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creator Yasuda, Hirotsugu
Ledernez, Loic
Olcaytug, Fethi
Urban, Gerald
description When the electric field in the dark gas phase reaches the threshold value, an electron avalanche (breakdown) occurs, which causes dissociation of organic molecules, excitation of chemically reactive molecular gas, and/or ionization of atomic gas, depending on the type of gas involved. The principles that govern these electron-impact reactions are collectively described by the term "electron dynamics". The electron-impact dissociation of organic molecules is the key factor for the deposition plasma. The implications of the interfacial avalanche of the primary electrons on the deposition plasma and also other plasma processes are discussed. The system dependency of low-pressure plasma deposition processes is an extremely important factor that should be reckoned, because the electron dynamic reactions are highly dependent on every aspect of the reaction system. The secondary electron emission from the cathode is a misinterpretation of the interfacial electron avalanche of the primary electrons described in this paper.
doi_str_mv 10.1351/pac200880091883
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subjects breakdown process
Electric fields
Electron avalanche
electron dynamics
Electron emission
Electrons
Ionization
Low pressure
magnetron plasma polymerization
Molecular gases
Organic chemistry
Plasma deposition
plasma polymerization
Pressure dependence
primary-electron emission
Vapor phases
title Electron dynamics of low-pressure deposition plasma
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