Effect of nitrogen doping on surface morphology, microstructure, chemical composition and intrinsic stress of nickel thin films deposited by reactive sputtering

N-doped nickel thin films were fabricated by direct current reactive magnetron sputtering, with varying nitrogen contents (0%–20%) added to the sputtering gas (Ar). To investigate the effect of nitrogen contents on morphology, microstructure, chemical composition and intrinsic stress of nickel thin...

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