Growth behavior of Cu, Ni and Cu/Ni electrodeposited microwires within porous Si

In this paper, a systematic growth behavior of Cu, Ni and Cu/Ni microwire arrays in porous silicon (PSi) templates is presented. After preparation of PSi templates via anodizing in HF solution, such microwires are successfully grown into PSi templates by electrodeposition method. Systematic scanning...

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Veröffentlicht in:	Surface & coatings technology 2019-04, Vol.364, p.16-21
Hauptverfasser:	Vesali, Newsha, Erfanifam, Salim, Jamilpanah, Loghman, Hasheminejad, Meisam, Rahmani, Yasser, Mohseni, Seyed Majid
Format:	Artikel
Sprache:	eng
Schlagworte:	Copper Electrodeposition Energy dispersive X ray spectroscopy Growth models Microwires Nickel Nucleation Porous silicon Scanning electron microscopy X-ray diffraction
Online-Zugang:	Volltext
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