Crosslinking in halogen containing novolac electron beam negative resists
Halogenophenol novolac (HPN)‐based negative resists exhibit excellent sensitivity and pattern resolution properties. The HPNs act as synergists for crosslinking with other irradiation labile compounds such as naphthoquinone diazide and bisazide vs. hydrogen halide (HX) elimination reaction, resultin...
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| Veröffentlicht in: | Polymer engineering and science 1995-01, Vol.35 (2), p.180-183 |
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| container_title | Polymer engineering and science |
| container_volume | 35 |
| creator | Lampe, I. V. Reinhardt, M. |
| description | Halogenophenol novolac (HPN)‐based negative resists exhibit excellent sensitivity and pattern resolution properties. The HPNs act as synergists for crosslinking with other irradiation labile compounds such as naphthoquinone diazide and bisazide vs. hydrogen halide (HX) elimination reaction, resulting in additional crosslinking, probably by aryl radical recombination and/or addition. We describe a new resist formulation based on HPN binder and melamine crosslinker (Cymel 303). In this case the irradiation induced HX elimination additionally catalyzes the melamine crosslinking. |
| doi_str_mv | 10.1002/pen.760350210 |
| format | Article |
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V. ; Reinhardt, M.</creator><creatorcontrib>Lampe, I. V. ; Reinhardt, M.</creatorcontrib><description>Halogenophenol novolac (HPN)‐based negative resists exhibit excellent sensitivity and pattern resolution properties. The HPNs act as synergists for crosslinking with other irradiation labile compounds such as naphthoquinone diazide and bisazide vs. hydrogen halide (HX) elimination reaction, resulting in additional crosslinking, probably by aryl radical recombination and/or addition. We describe a new resist formulation based on HPN binder and melamine crosslinker (Cymel 303). In this case the irradiation induced HX elimination additionally catalyzes the melamine crosslinking.</description><identifier>ISSN: 0032-3888</identifier><identifier>EISSN: 1548-2634</identifier><identifier>DOI: 10.1002/pen.760350210</identifier><identifier>CODEN: PYESAZ</identifier><language>eng</language><publisher>Brookfield: Society of Plastics Engineers</publisher><subject>Applied sciences ; Chemical properties ; Crosslinked polymers ; Exact sciences and technology ; Materials ; Melamine ; Photoresists ; Polymer industry, paints, wood ; Production processes ; Properties and testing ; Technology of polymers</subject><ispartof>Polymer engineering and science, 1995-01, Vol.35 (2), p.180-183</ispartof><rights>Copyright © 1995 Society of Plastics Engineers</rights><rights>1995 INIST-CNRS</rights><rights>COPYRIGHT 1995 Society of Plastics Engineers, Inc.</rights><rights>Copyright Society of Plastics Engineers January 1995</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c3580-4bb183f17662d159162280f571488a63d48ae2f5579d6b829fb5d1555af847f23</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fpen.760350210$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fpen.760350210$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,778,782,1414,4012,27906,27907,27908,45557,45558</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=3394461$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Lampe, I. 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In this case the irradiation induced HX elimination additionally catalyzes the melamine crosslinking.</description><subject>Applied sciences</subject><subject>Chemical properties</subject><subject>Crosslinked polymers</subject><subject>Exact sciences and technology</subject><subject>Materials</subject><subject>Melamine</subject><subject>Photoresists</subject><subject>Polymer industry, paints, wood</subject><subject>Production processes</subject><subject>Properties and testing</subject><subject>Technology of polymers</subject><issn>0032-3888</issn><issn>1548-2634</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1995</creationdate><recordtype>article</recordtype><recordid>eNp9kc1rGzEQxUVpoK7TY-9L6aGHbqqPlVZ7DCZ1DMEN_YRchFYebZWsJVdap8l_Hy02pgUTdBAMv5l5bx5Cbwk-IxjTTxvwZ7XAjGNK8As0IbySJRWseokmGDNaMinlK_Q6pVucecabCVrMYkipd_7O-a5wvvit-9CBL0zwg3Z-rPpwH3ptCujBDDH4ogW9Ljx0enD3UERILg3pFJ1Y3Sd4s_-n6Mfni--zy_Lqy3wxO78qDeMSl1XbEsksqYWgK8IbIiiV2PKaVFJqwVaV1EAt53WzEq2kjW155jjXVla1pWyK3u3mbmL4s4U0qNuwjT6vVJRIXguJSYY-7qBO96Cct2GI2mRfELM_D9bl8jkRQmCS5UxReQTPbwVrZ47xH_7jx2PBw9DpbUpq8e3rsdFmPHQEqzbRrXV8VASrMTaVY1OH2DL_fm9PJ6N7G7U3Lh2aGGuqSowG6x32Nyt7fH6mur5Y_rtgLyiHBg-HTh3vlKhZzdWv5VzNZzfLGyyl-smeAO-utGc</recordid><startdate>199501</startdate><enddate>199501</enddate><creator>Lampe, I. 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V. ; Reinhardt, M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3580-4bb183f17662d159162280f571488a63d48ae2f5579d6b829fb5d1555af847f23</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1995</creationdate><topic>Applied sciences</topic><topic>Chemical properties</topic><topic>Crosslinked polymers</topic><topic>Exact sciences and technology</topic><topic>Materials</topic><topic>Melamine</topic><topic>Photoresists</topic><topic>Polymer industry, paints, wood</topic><topic>Production processes</topic><topic>Properties and testing</topic><topic>Technology of polymers</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lampe, I. 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V.</au><au>Reinhardt, M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Crosslinking in halogen containing novolac electron beam negative resists</atitle><jtitle>Polymer engineering and science</jtitle><addtitle>Polym Eng Sci</addtitle><date>1995-01</date><risdate>1995</risdate><volume>35</volume><issue>2</issue><spage>180</spage><epage>183</epage><pages>180-183</pages><issn>0032-3888</issn><eissn>1548-2634</eissn><coden>PYESAZ</coden><abstract>Halogenophenol novolac (HPN)‐based negative resists exhibit excellent sensitivity and pattern resolution properties. The HPNs act as synergists for crosslinking with other irradiation labile compounds such as naphthoquinone diazide and bisazide vs. hydrogen halide (HX) elimination reaction, resulting in additional crosslinking, probably by aryl radical recombination and/or addition. We describe a new resist formulation based on HPN binder and melamine crosslinker (Cymel 303). 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| identifier | ISSN: 0032-3888 |
| ispartof | Polymer engineering and science, 1995-01, Vol.35 (2), p.180-183 |
| issn | 0032-3888 1548-2634 |
| language | eng |
| recordid | cdi_proquest_journals_218576801 |
| source | Wiley Online Library Journals Frontfile Complete |
| subjects | Applied sciences Chemical properties Crosslinked polymers Exact sciences and technology Materials Melamine Photoresists Polymer industry, paints, wood Production processes Properties and testing Technology of polymers |
| title | Crosslinking in halogen containing novolac electron beam negative resists |
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