Electrochemical Detection of Arsenic(III) Using Iridium-Implanted Boron-Doped Diamond Electrodes
Iridium-modified, boron-doped diamond electrodes fabricated by an ion implantation method have been developed for electrochemical detection of arsenite (As(III)). Ir+ ions were implanted with an energy of 800 keV and a dose of 1015 ion cm-2. An annealing treatment at 850 °C for 45 min in H2 plasma (...
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| Veröffentlicht in: | Analytical chemistry (Washington) 2006-09, Vol.78 (18), p.6291-6298 |
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| creator | Ivandini, Tribidasari A. Sato, Rika Makide, Yoshihiro Fujishima, Akira Einaga, Yasuaki |
| description | Iridium-modified, boron-doped diamond electrodes fabricated by an ion implantation method have been developed for electrochemical detection of arsenite (As(III)). Ir+ ions were implanted with an energy of 800 keV and a dose of 1015 ion cm-2. An annealing treatment at 850 °C for 45 min in H2 plasma (80 Torr) was required to rearrange metastable diamond produced by an implantation process. Characterization was investigated by SEM, AFM, Raman, and X-ray photoelectron spectroscopy. Cyclic voltammetry and flow injection analysis with amperometric detection were used to study the electrochemical reaction. The electrodes exhibited high catalytic activity toward As(III) oxidation with the detection limit (S/N = 3), sensitivity, and linearity of 20 nM (1.5 ppb), 93 nA μM-1 cm-2, and 0.999, respectively. The precision for 10 replicate determinations of 50 μM As(III) was 4.56% relative standard deviation. The advantageous properties of the electrodes were its inherent stability with a very low background current. The electrode was applicable for analysis of spiked arsenic in tap water containing a significant amount of various ion elements. The results indicate that the metal-implanted method could be promising for controlling the electrochemical properties of diamond electrodes. |
| doi_str_mv | 10.1021/ac0519514 |
| format | Article |
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Ir+ ions were implanted with an energy of 800 keV and a dose of 1015 ion cm-2. An annealing treatment at 850 °C for 45 min in H2 plasma (80 Torr) was required to rearrange metastable diamond produced by an implantation process. Characterization was investigated by SEM, AFM, Raman, and X-ray photoelectron spectroscopy. Cyclic voltammetry and flow injection analysis with amperometric detection were used to study the electrochemical reaction. The electrodes exhibited high catalytic activity toward As(III) oxidation with the detection limit (S/N = 3), sensitivity, and linearity of 20 nM (1.5 ppb), 93 nA μM-1 cm-2, and 0.999, respectively. The precision for 10 replicate determinations of 50 μM As(III) was 4.56% relative standard deviation. The advantageous properties of the electrodes were its inherent stability with a very low background current. The electrode was applicable for analysis of spiked arsenic in tap water containing a significant amount of various ion elements. The results indicate that the metal-implanted method could be promising for controlling the electrochemical properties of diamond electrodes.</description><identifier>ISSN: 0003-2700</identifier><identifier>EISSN: 1520-6882</identifier><identifier>DOI: 10.1021/ac0519514</identifier><identifier>PMID: 16970300</identifier><identifier>CODEN: ANCHAM</identifier><language>eng</language><publisher>Washington, DC: American Chemical Society</publisher><subject>Analytical chemistry ; Arsenic ; Arsenites - analysis ; Boron - chemistry ; Chemistry ; Diamond - chemistry ; Diamonds ; Electrochemical methods ; Electrodes ; Exact sciences and technology ; Humans ; Ions ; Iridium - chemistry ; Metals ; Microscopy, Atomic Force ; Microscopy, Electron, Scanning ; Potentiometry - instrumentation ; Potentiometry - methods ; Spectrometric and optical methods ; Spectrum Analysis, Raman ; Water Pollutants, Chemical - analysis</subject><ispartof>Analytical chemistry (Washington), 2006-09, Vol.78 (18), p.6291-6298</ispartof><rights>Copyright © 2006 American Chemical Society</rights><rights>2006 INIST-CNRS</rights><rights>Copyright American Chemical Society Sep 15, 2006</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a404t-e7b7a13f9c77fe979ec196f414f5759aa27b5b35525cc030847c86fe8947fdee3</citedby><cites>FETCH-LOGICAL-a404t-e7b7a13f9c77fe979ec196f414f5759aa27b5b35525cc030847c86fe8947fdee3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/ac0519514$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/ac0519514$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>314,776,780,2752,27053,27901,27902,56713,56763</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=18118496$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/16970300$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Ivandini, Tribidasari A.</creatorcontrib><creatorcontrib>Sato, Rika</creatorcontrib><creatorcontrib>Makide, Yoshihiro</creatorcontrib><creatorcontrib>Fujishima, Akira</creatorcontrib><creatorcontrib>Einaga, Yasuaki</creatorcontrib><title>Electrochemical Detection of Arsenic(III) Using Iridium-Implanted Boron-Doped Diamond Electrodes</title><title>Analytical chemistry (Washington)</title><addtitle>Anal. Chem</addtitle><description>Iridium-modified, boron-doped diamond electrodes fabricated by an ion implantation method have been developed for electrochemical detection of arsenite (As(III)). Ir+ ions were implanted with an energy of 800 keV and a dose of 1015 ion cm-2. An annealing treatment at 850 °C for 45 min in H2 plasma (80 Torr) was required to rearrange metastable diamond produced by an implantation process. Characterization was investigated by SEM, AFM, Raman, and X-ray photoelectron spectroscopy. Cyclic voltammetry and flow injection analysis with amperometric detection were used to study the electrochemical reaction. The electrodes exhibited high catalytic activity toward As(III) oxidation with the detection limit (S/N = 3), sensitivity, and linearity of 20 nM (1.5 ppb), 93 nA μM-1 cm-2, and 0.999, respectively. The precision for 10 replicate determinations of 50 μM As(III) was 4.56% relative standard deviation. The advantageous properties of the electrodes were its inherent stability with a very low background current. The electrode was applicable for analysis of spiked arsenic in tap water containing a significant amount of various ion elements. The results indicate that the metal-implanted method could be promising for controlling the electrochemical properties of diamond electrodes.</description><subject>Analytical chemistry</subject><subject>Arsenic</subject><subject>Arsenites - analysis</subject><subject>Boron - chemistry</subject><subject>Chemistry</subject><subject>Diamond - chemistry</subject><subject>Diamonds</subject><subject>Electrochemical methods</subject><subject>Electrodes</subject><subject>Exact sciences and technology</subject><subject>Humans</subject><subject>Ions</subject><subject>Iridium - chemistry</subject><subject>Metals</subject><subject>Microscopy, Atomic Force</subject><subject>Microscopy, Electron, Scanning</subject><subject>Potentiometry - instrumentation</subject><subject>Potentiometry - methods</subject><subject>Spectrometric and optical methods</subject><subject>Spectrum Analysis, Raman</subject><subject>Water Pollutants, Chemical - analysis</subject><issn>0003-2700</issn><issn>1520-6882</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><sourceid>EIF</sourceid><recordid>eNpl0Mtu3CAUBmAUtUqmaRd9gciqVKlZODnYYGCZZnKxlChVc1F2lMGHlHRspuCR2rcv0ViZRVcg-PRz-An5SOGIQkWPjQVOFadsh8wor6BspKzekBkA1GUlAPbIu5SeASgF2uySPdooATXAjPw4W6IdY7A_sffWLIs5jvnAh6EIrjiJCQdvv7Rte1jcJz88FW30nV_3ZduvlmYYsSu-hhiGch5WeT_3pg9DV0ypHab35K0zy4QfpnWf3J-f3Z1ellc3F-3pyVVpGLCxRLEQhtZOWSEcKqHQUtU4RpnjgitjKrHgi5rzilubR5dMWNk4lIoJ1yHW--TTJncVw-81plE_h3Uc8pO6okIKWTOR0eEG2RhSiuj0KvrexL-agn6pUr9Wme3BFLhe9Nht5dRdBp8nYFJuzkUzWJ-2TlIqmWqyKzfOpxH_vN6b-Es3ohZc33271dfq8vbhsfquz7e5xqbtJ_4f8B-_4JTq</recordid><startdate>20060915</startdate><enddate>20060915</enddate><creator>Ivandini, Tribidasari A.</creator><creator>Sato, Rika</creator><creator>Makide, Yoshihiro</creator><creator>Fujishima, Akira</creator><creator>Einaga, Yasuaki</creator><general>American Chemical Society</general><scope>BSCLL</scope><scope>IQODW</scope><scope>CGR</scope><scope>CUY</scope><scope>CVF</scope><scope>ECM</scope><scope>EIF</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QF</scope><scope>7QO</scope><scope>7QQ</scope><scope>7SC</scope><scope>7SE</scope><scope>7SP</scope><scope>7SR</scope><scope>7TA</scope><scope>7TB</scope><scope>7TM</scope><scope>7U5</scope><scope>7U7</scope><scope>7U9</scope><scope>8BQ</scope><scope>8FD</scope><scope>C1K</scope><scope>F28</scope><scope>FR3</scope><scope>H8D</scope><scope>H8G</scope><scope>H94</scope><scope>JG9</scope><scope>JQ2</scope><scope>KR7</scope><scope>L7M</scope><scope>L~C</scope><scope>L~D</scope><scope>P64</scope></search><sort><creationdate>20060915</creationdate><title>Electrochemical Detection of Arsenic(III) Using Iridium-Implanted Boron-Doped Diamond Electrodes</title><author>Ivandini, Tribidasari A. ; Sato, Rika ; Makide, Yoshihiro ; Fujishima, Akira ; Einaga, Yasuaki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a404t-e7b7a13f9c77fe979ec196f414f5759aa27b5b35525cc030847c86fe8947fdee3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>Analytical chemistry</topic><topic>Arsenic</topic><topic>Arsenites - analysis</topic><topic>Boron - chemistry</topic><topic>Chemistry</topic><topic>Diamond - chemistry</topic><topic>Diamonds</topic><topic>Electrochemical methods</topic><topic>Electrodes</topic><topic>Exact sciences and technology</topic><topic>Humans</topic><topic>Ions</topic><topic>Iridium - chemistry</topic><topic>Metals</topic><topic>Microscopy, Atomic Force</topic><topic>Microscopy, Electron, Scanning</topic><topic>Potentiometry - instrumentation</topic><topic>Potentiometry - methods</topic><topic>Spectrometric and optical methods</topic><topic>Spectrum Analysis, Raman</topic><topic>Water Pollutants, Chemical - analysis</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ivandini, Tribidasari A.</creatorcontrib><creatorcontrib>Sato, Rika</creatorcontrib><creatorcontrib>Makide, Yoshihiro</creatorcontrib><creatorcontrib>Fujishima, Akira</creatorcontrib><creatorcontrib>Einaga, Yasuaki</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>Medline</collection><collection>MEDLINE</collection><collection>MEDLINE (Ovid)</collection><collection>MEDLINE</collection><collection>MEDLINE</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>Aluminium Industry Abstracts</collection><collection>Biotechnology Research Abstracts</collection><collection>Ceramic Abstracts</collection><collection>Computer and Information Systems Abstracts</collection><collection>Corrosion Abstracts</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Materials Business File</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Nucleic Acids Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Toxicology Abstracts</collection><collection>Virology and AIDS Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Environmental Sciences and Pollution Management</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>Aerospace Database</collection><collection>Copper Technical Reference Library</collection><collection>AIDS and Cancer Research Abstracts</collection><collection>Materials Research Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Civil Engineering Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Computer and Information Systems Abstracts Academic</collection><collection>Computer and Information Systems Abstracts Professional</collection><collection>Biotechnology and BioEngineering Abstracts</collection><jtitle>Analytical chemistry (Washington)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ivandini, Tribidasari A.</au><au>Sato, Rika</au><au>Makide, Yoshihiro</au><au>Fujishima, Akira</au><au>Einaga, Yasuaki</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrochemical Detection of Arsenic(III) Using Iridium-Implanted Boron-Doped Diamond Electrodes</atitle><jtitle>Analytical chemistry (Washington)</jtitle><addtitle>Anal. Chem</addtitle><date>2006-09-15</date><risdate>2006</risdate><volume>78</volume><issue>18</issue><spage>6291</spage><epage>6298</epage><pages>6291-6298</pages><issn>0003-2700</issn><eissn>1520-6882</eissn><coden>ANCHAM</coden><abstract>Iridium-modified, boron-doped diamond electrodes fabricated by an ion implantation method have been developed for electrochemical detection of arsenite (As(III)). Ir+ ions were implanted with an energy of 800 keV and a dose of 1015 ion cm-2. An annealing treatment at 850 °C for 45 min in H2 plasma (80 Torr) was required to rearrange metastable diamond produced by an implantation process. Characterization was investigated by SEM, AFM, Raman, and X-ray photoelectron spectroscopy. Cyclic voltammetry and flow injection analysis with amperometric detection were used to study the electrochemical reaction. The electrodes exhibited high catalytic activity toward As(III) oxidation with the detection limit (S/N = 3), sensitivity, and linearity of 20 nM (1.5 ppb), 93 nA μM-1 cm-2, and 0.999, respectively. The precision for 10 replicate determinations of 50 μM As(III) was 4.56% relative standard deviation. The advantageous properties of the electrodes were its inherent stability with a very low background current. The electrode was applicable for analysis of spiked arsenic in tap water containing a significant amount of various ion elements. The results indicate that the metal-implanted method could be promising for controlling the electrochemical properties of diamond electrodes.</abstract><cop>Washington, DC</cop><pub>American Chemical Society</pub><pmid>16970300</pmid><doi>10.1021/ac0519514</doi><tpages>8</tpages></addata></record> |
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| subjects | Analytical chemistry Arsenic Arsenites - analysis Boron - chemistry Chemistry Diamond - chemistry Diamonds Electrochemical methods Electrodes Exact sciences and technology Humans Ions Iridium - chemistry Metals Microscopy, Atomic Force Microscopy, Electron, Scanning Potentiometry - instrumentation Potentiometry - methods Spectrometric and optical methods Spectrum Analysis, Raman Water Pollutants, Chemical - analysis |
| title | Electrochemical Detection of Arsenic(III) Using Iridium-Implanted Boron-Doped Diamond Electrodes |
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