Band gap-tuned MoS2(1−x)Te2x thin films synthesized by a hybrid Co-sputtering and post-deposition tellurization annealing process
MoS2(1−x)Te2x thin films were fabricated by high-temperature co-sputtering deposition and post-deposition tellurization annealing using novel Te precursor (i-C3H7)2Te for the first time. As a result, high crystal quality MoS2(1−x)Te2x (6.5 nm) were successfully fabricated with the Te concentration x...
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Veröffentlicht in: | Journal of materials research 2017-08, Vol.32 (16), p.3021-3028 |
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Hauptverfasser: | , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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