Band gap-tuned MoS2(1−x)Te2x thin films synthesized by a hybrid Co-sputtering and post-deposition tellurization annealing process

MoS2(1−x)Te2x thin films were fabricated by high-temperature co-sputtering deposition and post-deposition tellurization annealing using novel Te precursor (i-C3H7)2Te for the first time. As a result, high crystal quality MoS2(1−x)Te2x (6.5 nm) were successfully fabricated with the Te concentration x...

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Veröffentlicht in:Journal of materials research 2017-08, Vol.32 (16), p.3021-3028
Hauptverfasser: Hibino, Yusuke, Ishihara, Seiya, Sawamoto, Naomi, Ohashi, Takumi, Matsuura, Kentarou, Machida, Hideaki, Wakabayashi, Hitoshi, Ogura, Atsushi
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Sprache:eng
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