Meniscus behavior under helium exposure for rapid resist spreading during nanoimprint lithography

Nanoimprint lithography under helium exposure plays an important role in realizing rapid resist spreading. It is expected that the reduction in the surface tension of the resist due to the diffusion of helium would have an impact on the spreading behavior of the resist. By assuming van der Waals pot...

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Veröffentlicht in:	Japanese Journal of Applied Physics 2018-10, Vol.57 (10), p.106507
Hauptverfasser:	Kashiwagi, Hiroyuki, Sato, Nobuyoshi, Hatano, Masayuki, Jung, Wooyung, Kono, Takuya, Nakasugi, Tetsuro
Format:	Artikel
Sprache:	eng
Schlagworte:	Curing Exposure Helium Lithography Nanotechnology Reduction Spreading Surface tension Ultraviolet radiation
Online-Zugang:	Volltext
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