Determination of phonon deformation potentials and strain-shift coefficients in Ge-rich Si^sub 1− x^ Ge ^sub x^ using bulk Ge-rich Si^sub 1− x^ Ge ^sub x^ crystals and oil-immersion Raman spectroscopy

The strain-free Raman shift of the Ge–Ge mode, ..., of Ge-rich Si1− x Ge x (x: Ge fraction) was determined accurately from the bulk Ge-rich Si1− x Ge x samples fabricated by the Czochralski (Cz) method. Using the obtained ..., the phonon deformation potentials (PDPs), p and q, and the strain-shift c...

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Veröffentlicht in:Japanese Journal of Applied Physics 2018-10, Vol.57 (10), p.106601
Hauptverfasser: Yokogawa, Ryo, Takeuchi, Kazuma, Murakami, Tatsumi, Usuda, Koji, Yonenaga, Ichiro, Ogura, Atsushi
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Sprache:eng
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Zusammenfassung:The strain-free Raman shift of the Ge–Ge mode, ..., of Ge-rich Si1− x Ge x (x: Ge fraction) was determined accurately from the bulk Ge-rich Si1− x Ge x samples fabricated by the Czochralski (Cz) method. Using the obtained ..., the phonon deformation potentials (PDPs), p and q, and the strain-shift coefficient b LO of isotropic biaxial strained Ge-rich Si1− x Ge x thin films were extracted by oil-immersion Raman spectroscopy using Raman peak shifts of longitudinal and transverse optical (LO and TO) phonon modes. As a result, it was confirmed that these parameters are almost constant with small variations and that the strain-shift coefficient b LO is in good agreement with ab initio calculations. The parameters determined in this work are essential to realize accurate strain measurements using Raman spectroscopy for Ge-rich Si1− x Ge x devices. (ProQuest: ... denotes formulae omitted.)
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.57.106601