Gas-permeable templates using cellulose derivatives with acrylate and methacrylate groups for reducing in void defect density in ultraviolet nanoimprint lithography

Nanoimprint lithography has been applied to the manufacture of microlenses, antireflection films, and biochips because of its cost reduction advantage. Previously, we demonstrated a gas-permeable template derived from a thermal cross-linkable cellulose derivative with methacrylate (HPC-MOI) that eli...

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Veröffentlicht in:Japanese Journal of Applied Physics 2018-08, Vol.57 (8), p.86503
Hauptverfasser: Nakajima, Shinya, Takei, Satoshi, Takamatsu, Soichiro, Mizui, Kento, Oka, Toshitaka, Matsumoto, Yoko, Sekiguchi, Atsushi, Hanabata, Makoto
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Sprache:eng
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