Gas-permeable templates using cellulose derivatives with acrylate and methacrylate groups for reducing in void defect density in ultraviolet nanoimprint lithography
Nanoimprint lithography has been applied to the manufacture of microlenses, antireflection films, and biochips because of its cost reduction advantage. Previously, we demonstrated a gas-permeable template derived from a thermal cross-linkable cellulose derivative with methacrylate (HPC-MOI) that eli...
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Veröffentlicht in: | Japanese Journal of Applied Physics 2018-08, Vol.57 (8), p.86503 |
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container_title | Japanese Journal of Applied Physics |
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creator | Nakajima, Shinya Takei, Satoshi Takamatsu, Soichiro Mizui, Kento Oka, Toshitaka Matsumoto, Yoko Sekiguchi, Atsushi Hanabata, Makoto |
description | Nanoimprint lithography has been applied to the manufacture of microlenses, antireflection films, and biochips because of its cost reduction advantage. Previously, we demonstrated a gas-permeable template derived from a thermal cross-linkable cellulose derivative with methacrylate (HPC-MOI) that eliminated defects due to the concentration of acetone gas between the template and the imprint material. In this study, we prepared a thermoset cellulose derivative with acrylate as the gas-permeable template (HPC-AOI). The results of Raman spectroscopy and indentation test confirmed that HPC-AOI had a very high cross-linking density when heated for 10 min. The micrographs and three-dimensional (3D) image of the 5 µm line and space pattern in the UV cross-linked material containing a volatile solvent showed that void defects were removed and edges were sharper when the HPC-AOI template was utilized. |
doi_str_mv | 10.7567/JJAP.57.086503 |
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Previously, we demonstrated a gas-permeable template derived from a thermal cross-linkable cellulose derivative with methacrylate (HPC-MOI) that eliminated defects due to the concentration of acetone gas between the template and the imprint material. In this study, we prepared a thermoset cellulose derivative with acrylate as the gas-permeable template (HPC-AOI). The results of Raman spectroscopy and indentation test confirmed that HPC-AOI had a very high cross-linking density when heated for 10 min. 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J. Appl. Phys</addtitle><description>Nanoimprint lithography has been applied to the manufacture of microlenses, antireflection films, and biochips because of its cost reduction advantage. Previously, we demonstrated a gas-permeable template derived from a thermal cross-linkable cellulose derivative with methacrylate (HPC-MOI) that eliminated defects due to the concentration of acetone gas between the template and the imprint material. In this study, we prepared a thermoset cellulose derivative with acrylate as the gas-permeable template (HPC-AOI). The results of Raman spectroscopy and indentation test confirmed that HPC-AOI had a very high cross-linking density when heated for 10 min. The micrographs and three-dimensional (3D) image of the 5 µm line and space pattern in the UV cross-linked material containing a volatile solvent showed that void defects were removed and edges were sharper when the HPC-AOI template was utilized.</description><subject>Acetone</subject><subject>Biochips</subject><subject>Cellulose</subject><subject>Crosslinking</subject><subject>Defects</subject><subject>Density</subject><subject>Hardness tests</subject><subject>Indentation</subject><subject>Lithography</subject><subject>Microlenses</subject><subject>Nanotechnology</subject><subject>Permeability</subject><subject>Photomicrographs</subject><subject>Raman spectroscopy</subject><subject>Thermosetting resins</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNp1kcFq3DAQhkVJoZu0154FvYSAt5Jl2d5jCGnaEGgP7VnI0mhXi2wpkrxl36cPWpkNySU5DTPzzT8z_Ah9pmTd8bb7en9__WvNuzXpW07YO7SirOmqhrT8DK0IqWnVbOr6AzpPaV_Sljd0hf7dyVQFiCPIwQHOMAYnMyQ8JzttsQLnZucTYA3RHmS2h9L7a_MOSxWPC4rlpPEIefdc2EY_h4SNjziCntUiZCd88FYXGQMqlzAlm49LeXY5yoP1DjKe5OTtGKKdMnZlid9GGXbHj-i9kS7Bp6d4gf58u_198716-Hn34-b6oVKM8Vz1dXmrp1wZpZQeNmRoDNT9oJgicoCGSlIbbRoYtOzbjskNJUqyRm94C7QHdoG-nHRD9I8zpCz2fo5TWSlq2naE8r7mhVqfKBV9ShGMKAePMh4FJWJxQixOCN6JkxNl4Oo0YH14UXwTvnwF3u9lWKD-CRNBG_YfjdWcnA</recordid><startdate>20180801</startdate><enddate>20180801</enddate><creator>Nakajima, Shinya</creator><creator>Takei, Satoshi</creator><creator>Takamatsu, Soichiro</creator><creator>Mizui, Kento</creator><creator>Oka, Toshitaka</creator><creator>Matsumoto, Yoko</creator><creator>Sekiguchi, Atsushi</creator><creator>Hanabata, Makoto</creator><general>The Japan Society of Applied Physics</general><general>Japanese Journal of Applied Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20180801</creationdate><title>Gas-permeable templates using cellulose derivatives with acrylate and methacrylate groups for reducing in void defect density in ultraviolet nanoimprint lithography</title><author>Nakajima, Shinya ; Takei, Satoshi ; Takamatsu, Soichiro ; Mizui, Kento ; Oka, Toshitaka ; Matsumoto, Yoko ; Sekiguchi, Atsushi ; Hanabata, Makoto</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c335t-82002815cfcccdb90b4fe28bc3c0abe41a02fdf4ebda8673a910ca34d956e18e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>Acetone</topic><topic>Biochips</topic><topic>Cellulose</topic><topic>Crosslinking</topic><topic>Defects</topic><topic>Density</topic><topic>Hardness tests</topic><topic>Indentation</topic><topic>Lithography</topic><topic>Microlenses</topic><topic>Nanotechnology</topic><topic>Permeability</topic><topic>Photomicrographs</topic><topic>Raman spectroscopy</topic><topic>Thermosetting resins</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Nakajima, Shinya</creatorcontrib><creatorcontrib>Takei, Satoshi</creatorcontrib><creatorcontrib>Takamatsu, Soichiro</creatorcontrib><creatorcontrib>Mizui, Kento</creatorcontrib><creatorcontrib>Oka, Toshitaka</creatorcontrib><creatorcontrib>Matsumoto, Yoko</creatorcontrib><creatorcontrib>Sekiguchi, Atsushi</creatorcontrib><creatorcontrib>Hanabata, Makoto</creatorcontrib><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Nakajima, Shinya</au><au>Takei, Satoshi</au><au>Takamatsu, Soichiro</au><au>Mizui, Kento</au><au>Oka, Toshitaka</au><au>Matsumoto, Yoko</au><au>Sekiguchi, Atsushi</au><au>Hanabata, Makoto</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Gas-permeable templates using cellulose derivatives with acrylate and methacrylate groups for reducing in void defect density in ultraviolet nanoimprint lithography</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><addtitle>Jpn. J. Appl. Phys</addtitle><date>2018-08-01</date><risdate>2018</risdate><volume>57</volume><issue>8</issue><spage>86503</spage><pages>86503-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPB6</coden><abstract>Nanoimprint lithography has been applied to the manufacture of microlenses, antireflection films, and biochips because of its cost reduction advantage. Previously, we demonstrated a gas-permeable template derived from a thermal cross-linkable cellulose derivative with methacrylate (HPC-MOI) that eliminated defects due to the concentration of acetone gas between the template and the imprint material. In this study, we prepared a thermoset cellulose derivative with acrylate as the gas-permeable template (HPC-AOI). The results of Raman spectroscopy and indentation test confirmed that HPC-AOI had a very high cross-linking density when heated for 10 min. The micrographs and three-dimensional (3D) image of the 5 µm line and space pattern in the UV cross-linked material containing a volatile solvent showed that void defects were removed and edges were sharper when the HPC-AOI template was utilized.</abstract><cop>Tokyo</cop><pub>The Japan Society of Applied Physics</pub><doi>10.7567/JJAP.57.086503</doi><tpages>6</tpages></addata></record> |
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subjects | Acetone Biochips Cellulose Crosslinking Defects Density Hardness tests Indentation Lithography Microlenses Nanotechnology Permeability Photomicrographs Raman spectroscopy Thermosetting resins |
title | Gas-permeable templates using cellulose derivatives with acrylate and methacrylate groups for reducing in void defect density in ultraviolet nanoimprint lithography |
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