New solid-state die-attach method using silver foil bonded on aluminum substrate by eutectic reaction

The high thermal conductivity, lightweight, and low cost of aluminum (Al) make it a promising substrate material for high power electronic and photonic packages and housings. It is particularly attractive for aerospace and space applications due to its lightweight. A main challenge for these applica...

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Veröffentlicht in:Journal of alloys and compounds 2019-02, Vol.774, p.1207-1215
Hauptverfasser: Fu, Shao-Wei, Lee, Chin C.
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Lee, Chin C.
description The high thermal conductivity, lightweight, and low cost of aluminum (Al) make it a promising substrate material for high power electronic and photonic packages and housings. It is particularly attractive for aerospace and space applications due to its lightweight. A main challenge for these applications is poor bondability. The native aluminum oxide (Al2O3) prevents aluminum from bonding by using popular die-attach materials such as solders. Zincating process is often needed to dissolve the Al2O3 layer and deposit a protection zinc layer which provides a basis for subsequent metallization or soldering process. However, the zincating and metallization processes could increase the processing cost and bring more reliability issues. In this research, a novel Ag foil bonding technique has been developed to bond Ag foils directly to Al substrates to produce Ag-cladded Al substrates. Two Ag-Al bonding processes are developed: solid-state and eutectic. Subsequently, Si chips are bonded to the Ag-cladded Al substrates using solid-state process at 300 °C without any additional die-attach material. For the Ag-Al bonding processes, no surface treatment is applied to Al substrates to remove the native Al2O3 layer. In the Ag-Al soli-state bonding process, Ag and Al atoms inter-diffused through the thin Al2O3 to react and form Ag2Al and Ag3Al compounds. In the Ag-Al eutectic bonding process, Ag2Al+(Al) eutectic structure forms at the Ag/Al interface without Ag3Al compound formation. The native Al2O3 layer, a potential fracture path, is broken into pieces during eutectic reaction and possibly dispersed into the eutectic structure. Shear test results of Si/Ag/Al joint samples far exceed the military criterion (MIL-STD-883H method 2019.8). The Si/Ag/Al structures break either along the Ag/Al interface or within the Si chip. With the advantages of high thermal conductivity, high reliability, lightweight, and process simplicity, the Ag-cladded Al structures should be highly valuable for applications in packages and housings where lightweight and high heat-conducting are necessary. •A new Ag foil bonding technique has been developed to bond Ag foil directly to Al.•Two Ag-Al bonding processes are developed: solid-state and eutectic reaction.•The breaking force of the Si/Ag/Al joint samples far exceed the military criterion.•The fracture mechanisms of the Ag-Al solid-state/eutectic bondings are studied.•The Ag-Al eutectic bonding exhibits a mixed fracture mode with ductile feat
doi_str_mv 10.1016/j.jallcom.2018.09.254
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It is particularly attractive for aerospace and space applications due to its lightweight. A main challenge for these applications is poor bondability. The native aluminum oxide (Al2O3) prevents aluminum from bonding by using popular die-attach materials such as solders. Zincating process is often needed to dissolve the Al2O3 layer and deposit a protection zinc layer which provides a basis for subsequent metallization or soldering process. However, the zincating and metallization processes could increase the processing cost and bring more reliability issues. In this research, a novel Ag foil bonding technique has been developed to bond Ag foils directly to Al substrates to produce Ag-cladded Al substrates. Two Ag-Al bonding processes are developed: solid-state and eutectic. Subsequently, Si chips are bonded to the Ag-cladded Al substrates using solid-state process at 300 °C without any additional die-attach material. For the Ag-Al bonding processes, no surface treatment is applied to Al substrates to remove the native Al2O3 layer. In the Ag-Al soli-state bonding process, Ag and Al atoms inter-diffused through the thin Al2O3 to react and form Ag2Al and Ag3Al compounds. In the Ag-Al eutectic bonding process, Ag2Al+(Al) eutectic structure forms at the Ag/Al interface without Ag3Al compound formation. The native Al2O3 layer, a potential fracture path, is broken into pieces during eutectic reaction and possibly dispersed into the eutectic structure. Shear test results of Si/Ag/Al joint samples far exceed the military criterion (MIL-STD-883H method 2019.8). The Si/Ag/Al structures break either along the Ag/Al interface or within the Si chip. 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It is particularly attractive for aerospace and space applications due to its lightweight. A main challenge for these applications is poor bondability. The native aluminum oxide (Al2O3) prevents aluminum from bonding by using popular die-attach materials such as solders. Zincating process is often needed to dissolve the Al2O3 layer and deposit a protection zinc layer which provides a basis for subsequent metallization or soldering process. However, the zincating and metallization processes could increase the processing cost and bring more reliability issues. In this research, a novel Ag foil bonding technique has been developed to bond Ag foils directly to Al substrates to produce Ag-cladded Al substrates. Two Ag-Al bonding processes are developed: solid-state and eutectic. Subsequently, Si chips are bonded to the Ag-cladded Al substrates using solid-state process at 300 °C without any additional die-attach material. For the Ag-Al bonding processes, no surface treatment is applied to Al substrates to remove the native Al2O3 layer. In the Ag-Al soli-state bonding process, Ag and Al atoms inter-diffused through the thin Al2O3 to react and form Ag2Al and Ag3Al compounds. In the Ag-Al eutectic bonding process, Ag2Al+(Al) eutectic structure forms at the Ag/Al interface without Ag3Al compound formation. The native Al2O3 layer, a potential fracture path, is broken into pieces during eutectic reaction and possibly dispersed into the eutectic structure. Shear test results of Si/Ag/Al joint samples far exceed the military criterion (MIL-STD-883H method 2019.8). The Si/Ag/Al structures break either along the Ag/Al interface or within the Si chip. 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Lee, Chin C.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c337t-45cf8ea9244862c936446c2f8ac7509c5138ecec0027c76349a835e7ff48dd323</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>Aluminum</topic><topic>Aluminum oxide</topic><topic>Breaking</topic><topic>Diffusion</topic><topic>Electronic packaging</topic><topic>Eutectic bonding process</topic><topic>Eutectic reactions</topic><topic>Eutectics</topic><topic>Fracture mechanism</topic><topic>Heat conductivity</topic><topic>Heat transfer</topic><topic>Heat transmission</topic><topic>Housings</topic><topic>Intermetallic compound</topic><topic>Lightweight</topic><topic>Metal foils</topic><topic>Metallizing</topic><topic>Packages</topic><topic>Photonics</topic><topic>Shear tests</topic><topic>Silicon</topic><topic>Silver</topic><topic>Silver-aluminum direct bonding</topic><topic>Soldering</topic><topic>Solders</topic><topic>Solid state</topic><topic>Solids</topic><topic>Space applications</topic><topic>Substrates</topic><topic>Surface treatment</topic><topic>Thermal conductivity</topic><topic>Weight reduction</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Fu, Shao-Wei</creatorcontrib><creatorcontrib>Lee, Chin C.</creatorcontrib><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of alloys and compounds</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Fu, Shao-Wei</au><au>Lee, Chin C.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>New solid-state die-attach method using silver foil bonded on aluminum substrate by eutectic reaction</atitle><jtitle>Journal of alloys and compounds</jtitle><date>2019-02-05</date><risdate>2019</risdate><volume>774</volume><spage>1207</spage><epage>1215</epage><pages>1207-1215</pages><issn>0925-8388</issn><eissn>1873-4669</eissn><abstract>The high thermal conductivity, lightweight, and low cost of aluminum (Al) make it a promising substrate material for high power electronic and photonic packages and housings. It is particularly attractive for aerospace and space applications due to its lightweight. A main challenge for these applications is poor bondability. The native aluminum oxide (Al2O3) prevents aluminum from bonding by using popular die-attach materials such as solders. Zincating process is often needed to dissolve the Al2O3 layer and deposit a protection zinc layer which provides a basis for subsequent metallization or soldering process. However, the zincating and metallization processes could increase the processing cost and bring more reliability issues. In this research, a novel Ag foil bonding technique has been developed to bond Ag foils directly to Al substrates to produce Ag-cladded Al substrates. Two Ag-Al bonding processes are developed: solid-state and eutectic. Subsequently, Si chips are bonded to the Ag-cladded Al substrates using solid-state process at 300 °C without any additional die-attach material. For the Ag-Al bonding processes, no surface treatment is applied to Al substrates to remove the native Al2O3 layer. In the Ag-Al soli-state bonding process, Ag and Al atoms inter-diffused through the thin Al2O3 to react and form Ag2Al and Ag3Al compounds. In the Ag-Al eutectic bonding process, Ag2Al+(Al) eutectic structure forms at the Ag/Al interface without Ag3Al compound formation. The native Al2O3 layer, a potential fracture path, is broken into pieces during eutectic reaction and possibly dispersed into the eutectic structure. Shear test results of Si/Ag/Al joint samples far exceed the military criterion (MIL-STD-883H method 2019.8). The Si/Ag/Al structures break either along the Ag/Al interface or within the Si chip. With the advantages of high thermal conductivity, high reliability, lightweight, and process simplicity, the Ag-cladded Al structures should be highly valuable for applications in packages and housings where lightweight and high heat-conducting are necessary. •A new Ag foil bonding technique has been developed to bond Ag foil directly to Al.•Two Ag-Al bonding processes are developed: solid-state and eutectic reaction.•The breaking force of the Si/Ag/Al joint samples far exceed the military criterion.•The fracture mechanisms of the Ag-Al solid-state/eutectic bondings are studied.•The Ag-Al eutectic bonding exhibits a mixed fracture mode with ductile features.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/j.jallcom.2018.09.254</doi><tpages>9</tpages><orcidid>https://orcid.org/0000-0002-0372-7569</orcidid></addata></record>
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ispartof Journal of alloys and compounds, 2019-02, Vol.774, p.1207-1215
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1873-4669
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source Elsevier ScienceDirect Journals
subjects Aluminum
Aluminum oxide
Breaking
Diffusion
Electronic packaging
Eutectic bonding process
Eutectic reactions
Eutectics
Fracture mechanism
Heat conductivity
Heat transfer
Heat transmission
Housings
Intermetallic compound
Lightweight
Metal foils
Metallizing
Packages
Photonics
Shear tests
Silicon
Silver
Silver-aluminum direct bonding
Soldering
Solders
Solid state
Solids
Space applications
Substrates
Surface treatment
Thermal conductivity
Weight reduction
title New solid-state die-attach method using silver foil bonded on aluminum substrate by eutectic reaction
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