Structural, Optical and Sensing Behavior of Neodymium-Doped Vanadium Pentoxide Thin Films

In this study, nanocrystals of vanadium pentoxide (V 2 O 5 ) thin films were manufactured by chemical spray pyrolysis technique. A precursor solution of 0.05 M VCl 5 was prepared using distilled water. Neodymium (Nd)-doped vanadium oxide films were fabricated, increasing the neodymium chloride by ra...

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Veröffentlicht in:Iranian journal of science and technology. Transaction A, Science Science, 2018-12, Vol.42 (4), p.2375-2386
Hauptverfasser: Ali, Iftikhar M., Rzaij, Jamal M., Abbas, Qayes A., Ibrahim, Isam M., Alatta, Hassan J.
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container_issue 4
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container_title Iranian journal of science and technology. Transaction A, Science
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creator Ali, Iftikhar M.
Rzaij, Jamal M.
Abbas, Qayes A.
Ibrahim, Isam M.
Alatta, Hassan J.
description In this study, nanocrystals of vanadium pentoxide (V 2 O 5 ) thin films were manufactured by chemical spray pyrolysis technique. A precursor solution of 0.05 M VCl 5 was prepared using distilled water. Neodymium (Nd)-doped vanadium oxide films were fabricated, increasing the neodymium chloride by ratios of 0, 3, 5, 7 and 9% in separate solutions. These precursor solutions have been utilized to grow films of undoped V 2 O 5 and doped with Nd on the p-type Si (111) porous silicon (PS) and glass substrates at temperatures of 250 °C. The structural, optical, electrical and gas sensing properties were studied. The analysis of the structural and optical properties of the thin films shows the effect of doping rates on the characteristics of vanadium oxide. The X-ray diffraction investigation resulted in a polycrystalline nature of the orthorhombic structure with the preferred direction of (010) with nano-grain sizes. Atomic force microscopy (AFM) was used to characterize the morphological properties of the films. Undoped V 2 O 5 and doped V 2 O 5 with various concentrations of Nd films directly allowed the transition of the band gap. The sensitivity of NO 2 and H 2 gases for various doping ratios of Nd at different operating temperatures was measured.
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A precursor solution of 0.05 M VCl 5 was prepared using distilled water. Neodymium (Nd)-doped vanadium oxide films were fabricated, increasing the neodymium chloride by ratios of 0, 3, 5, 7 and 9% in separate solutions. These precursor solutions have been utilized to grow films of undoped V 2 O 5 and doped with Nd on the p-type Si (111) porous silicon (PS) and glass substrates at temperatures of 250 °C. The structural, optical, electrical and gas sensing properties were studied. The analysis of the structural and optical properties of the thin films shows the effect of doping rates on the characteristics of vanadium oxide. The X-ray diffraction investigation resulted in a polycrystalline nature of the orthorhombic structure with the preferred direction of (010) with nano-grain sizes. Atomic force microscopy (AFM) was used to characterize the morphological properties of the films. Undoped V 2 O 5 and doped V 2 O 5 with various concentrations of Nd films directly allowed the transition of the band gap. The sensitivity of NO 2 and H 2 gases for various doping ratios of Nd at different operating temperatures was measured.</description><identifier>ISSN: 1028-6276</identifier><identifier>EISSN: 2364-1819</identifier><identifier>DOI: 10.1007/s40995-018-0553-5</identifier><language>eng</language><publisher>Cham: Springer International Publishing</publisher><subject>Atomic force microscopy ; Chemistry/Food Science ; Distilled water ; Doping ; Earth Sciences ; Electrons ; Engineering ; Gas sensors ; Gases ; Glass substrates ; Grain ; Investigations ; Life Sciences ; Materials Science ; Metal oxides ; Microscopy ; Neodymium ; Operating temperature ; Optical properties ; Organic chemistry ; Oxide coatings ; Physics ; Porous silicon ; Precursors ; Pyrolysis ; Radiation ; Research Paper ; Sensors ; Silicon substrates ; Silicon wafers ; Spray pyrolysis ; Studies ; Temperature ; Thin films ; Vanadium ; Vanadium oxides ; Vanadium pentoxide ; X-ray diffraction</subject><ispartof>Iranian journal of science and technology. 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Neodymium (Nd)-doped vanadium oxide films were fabricated, increasing the neodymium chloride by ratios of 0, 3, 5, 7 and 9% in separate solutions. These precursor solutions have been utilized to grow films of undoped V 2 O 5 and doped with Nd on the p-type Si (111) porous silicon (PS) and glass substrates at temperatures of 250 °C. The structural, optical, electrical and gas sensing properties were studied. The analysis of the structural and optical properties of the thin films shows the effect of doping rates on the characteristics of vanadium oxide. The X-ray diffraction investigation resulted in a polycrystalline nature of the orthorhombic structure with the preferred direction of (010) with nano-grain sizes. Atomic force microscopy (AFM) was used to characterize the morphological properties of the films. Undoped V 2 O 5 and doped V 2 O 5 with various concentrations of Nd films directly allowed the transition of the band gap. The sensitivity of NO 2 and H 2 gases for various doping ratios of Nd at different operating temperatures was measured.</abstract><cop>Cham</cop><pub>Springer International Publishing</pub><doi>10.1007/s40995-018-0553-5</doi><tpages>12</tpages></addata></record>
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ispartof Iranian journal of science and technology. Transaction A, Science, 2018-12, Vol.42 (4), p.2375-2386
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2364-1819
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subjects Atomic force microscopy
Chemistry/Food Science
Distilled water
Doping
Earth Sciences
Electrons
Engineering
Gas sensors
Gases
Glass substrates
Grain
Investigations
Life Sciences
Materials Science
Metal oxides
Microscopy
Neodymium
Operating temperature
Optical properties
Organic chemistry
Oxide coatings
Physics
Porous silicon
Precursors
Pyrolysis
Radiation
Research Paper
Sensors
Silicon substrates
Silicon wafers
Spray pyrolysis
Studies
Temperature
Thin films
Vanadium
Vanadium oxides
Vanadium pentoxide
X-ray diffraction
title Structural, Optical and Sensing Behavior of Neodymium-Doped Vanadium Pentoxide Thin Films
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