Giant dielectric constant in TiO2/Al2O3 nanolaminates grown on doped silicon substrate by pulsed laser deposition

High quality amorphous nanolaminates by means of alternate Al2O3 and TiO2 oxide sublayers were grown with atomic scale thickness control by pulsed laser deposition. A giant dielectric constant (>10 000), strongly enhanced compared to the value of either Al2O3 or TiO2 or their solid solution, was...

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Veröffentlicht in:	Journal of applied physics 2014-03, Vol.115 (9)
Hauptverfasser:	Walke, P., Bouregba, R., Lefevre, A., Parat, G., Lallemand, F., Voiron, F., Mercey, B., Lüders, U.
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum oxide Applied physics Dependence Dielectric loss Dielectric relaxation Dielectric strength Permittivity Pulsed laser deposition Pulsed lasers Silicon substrates Solid solutions Space charge Thickness Titanium dioxide
Online-Zugang:	Volltext
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