Chemical reaction mechanism of ZnO grown using DEZn and N2O in MOCVD

ZnO thin films were prepared by metal–organic chemical vapor deposition (MOCVD) using diethylzinc (DEZn) and N2O. The chemical reaction process of DEZn and N2O in the gas phase was studied by density functional theory and computational fluid dynamics calculation. Kinetic and thermodynamic data provi...

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Veröffentlicht in:	CrystEngComm 2018, Vol.20 (42), p.6775-6785
Hauptverfasser:	Li, Jian, Gan, Hanlin, Xu, Yifeng, Wang, Chaoyang, Pei, Yanli, Feng Long Gu, Wang, Gang
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical reactions Computational fluid dynamics Computer simulation Density functional theory Dependence Film growth Growth rate Metalorganic chemical vapor deposition Migration Nitrous oxide Organic chemicals Organic chemistry Parasitics (electronics) Photovoltaic cells Reaction mechanisms Thin films Vapor phases Zinc oxide
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