Multilevel characteristics and memory mechanisms for nonvolatile memory devices based on CuInS2 quantum dot-polymethylmethacrylate nanocomposites

Nonvolatile memory devices based on CuInS2 (CIS) quantum dots (QDs) embedded in a polymethylmethacrylate (PMMA) layer were fabricated using spin-coating method. The memory window widths of the capacitance-voltage (C-V) curves for the Al/CIS QDs embedded in PMMA layer/p-Si devices were 0.3, 0.6, and...

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Veröffentlicht in:Applied physics letters 2014-12, Vol.105 (23)
Hauptverfasser: Zhou, Yang, Yun, Dong Yeol, Kim, Sang Wook, Kim, Tae Whan
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Kim, Tae Whan
description Nonvolatile memory devices based on CuInS2 (CIS) quantum dots (QDs) embedded in a polymethylmethacrylate (PMMA) layer were fabricated using spin-coating method. The memory window widths of the capacitance-voltage (C-V) curves for the Al/CIS QDs embedded in PMMA layer/p-Si devices were 0.3, 0.6, and 1.0 V for sweep voltages of ±3, ±5, and ±7 V, respectively. Capacitance-cycle data demonstrated that the charge-trapping capability of the devices with an ON/OFF ratio value of 2.81 × 10−10 was maintained for 8 × 103 cycles without significant degradation and that the extrapolation of the ON/OFF ratio value to 1 × 106 cycles converged to 2.40 × 10−10, indicative of the good stability of the devices. The memory mechanisms for the devices are described on the basis of the C-V curves and the energy-band diagrams.
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subjects Aluminum
Applied physics
Capacitance
Memory devices
Nanocomposites
Polymethyl methacrylate
Quantum dots
Random access memory
Silicon
Spin coating
title Multilevel characteristics and memory mechanisms for nonvolatile memory devices based on CuInS2 quantum dot-polymethylmethacrylate nanocomposites
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