Silicon nitride films fabricated by a plasma-enhanced chemical vapor deposition method for coatings of the laser interferometer gravitational wave detector

Silicon is a potential substrate material for the large-areal-size mirrors of the next-generation laser interferometer gravitational wave detector operated in cryogenics. Silicon nitride thin films uniformly deposited by a chemical vapor deposition method on large-size silicon wafers is a common pra...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Physical review. D 2018-01, Vol.97 (2), Article 022004
Hauptverfasser: Pan, Huang-Wei, Kuo, Ling-Chi, Huang, Shu-Yu, Wu, Meng-Yun, Juang, Yu-Hang, Lee, Chia-Wei, Chen, Hsin-Chieh, Wen, Ting Ting, Chao, Shiuh
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!