Properties of the extreme ultraviolet emission from germanium and gallium plasmas

We report on the usefulness of germanium (Ge) and gallium (Ga) plasmas as potential extreme ultraviolet (EUV) sources at both 6.x and 13.5 nm, wavelengths of interest for lithography and metrology applications. Spectra from plasmas produced using neodymium-doped yttrium-aluminum-garnet (Nd:YAG) lase...

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Veröffentlicht in:	Journal of applied physics 2015-08, Vol.118 (7)
Hauptverfasser:	Li, Bowen, Hara, Hiroyuki, Suzuki, Yuhei, Arai, Goki, Higashiguchi, Takeshi, Ohashi, Hayato, Jiang, Weihua, Makimura, Tetsuya, Sakaue, Hiroyuki A., Suzuki, Chihiro, Kato, Daiji, Murakami, Izumi, Dunne, Padraig, Long, Elaine, Sheridan, Paul, Chen, Ximeng, O'Sullivan, Gerry
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum Applied physics Atomic structure Electron beam lithography Emission analysis Emission spectra Gallium Germanium Ions Multilayers Neodymium Plasma Plasmas (physics) Ultraviolet emission YAG lasers Yttrium
Online-Zugang:	Volltext
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