Properties of the extreme ultraviolet emission from germanium and gallium plasmas
We report on the usefulness of germanium (Ge) and gallium (Ga) plasmas as potential extreme ultraviolet (EUV) sources at both 6.x and 13.5 nm, wavelengths of interest for lithography and metrology applications. Spectra from plasmas produced using neodymium-doped yttrium-aluminum-garnet (Nd:YAG) lase...
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creator | Li, Bowen Hara, Hiroyuki Suzuki, Yuhei Arai, Goki Higashiguchi, Takeshi Ohashi, Hayato Jiang, Weihua Makimura, Tetsuya Sakaue, Hiroyuki A. Suzuki, Chihiro Kato, Daiji Murakami, Izumi Dunne, Padraig Long, Elaine Sheridan, Paul Chen, Ximeng O'Sullivan, Gerry |
description | We report on the usefulness of germanium (Ge) and gallium (Ga) plasmas as potential extreme ultraviolet (EUV) sources at both 6.x and 13.5 nm, wavelengths of interest for lithography and metrology applications. Spectra from plasmas produced using neodymium-doped yttrium-aluminum-garnet (Nd:YAG) lasers with pulse durations of 170 ps and 7 ns [full width at half-maximum] and a compact electron beam ion trap have been used to determine the charge states responsible while theoretical calculations using atomic structure Cowan and HULLAC codes enabled the identification of structure in the Ge spectrum arising from strong transitions of the type 3d – 4p and 3d – 4f. Transitions of the type 3d – 4f in Ge10+ and Ga11+ were found to lie in the 6.x nm region, while 3p−3d transitions from a range of stages in both elements contribute in the 13.5 nm region. We also studied the emission spectra of galinstan plasmas, and the results imply that galinstan might provide a promising candidate for EUV applications that exploit the progress in the development of multilayer mirrors for operation at 6.x nm. |
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Spectra from plasmas produced using neodymium-doped yttrium-aluminum-garnet (Nd:YAG) lasers with pulse durations of 170 ps and 7 ns [full width at half-maximum] and a compact electron beam ion trap have been used to determine the charge states responsible while theoretical calculations using atomic structure Cowan and HULLAC codes enabled the identification of structure in the Ge spectrum arising from strong transitions of the type 3d – 4p and 3d – 4f. Transitions of the type 3d – 4f in Ge10+ and Ga11+ were found to lie in the 6.x nm region, while 3p−3d transitions from a range of stages in both elements contribute in the 13.5 nm region. We also studied the emission spectra of galinstan plasmas, and the results imply that galinstan might provide a promising candidate for EUV applications that exploit the progress in the development of multilayer mirrors for operation at 6.x nm.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.4928673</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>Aluminum ; Applied physics ; Atomic structure ; Electron beam lithography ; Emission analysis ; Emission spectra ; Gallium ; Germanium ; Ions ; Multilayers ; Neodymium ; Plasma ; Plasmas (physics) ; Ultraviolet emission ; YAG lasers ; Yttrium</subject><ispartof>Journal of applied physics, 2015-08, Vol.118 (7)</ispartof><rights>2015 AIP Publishing LLC.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c323t-4967753d25ebc43cb70f168bb2dfb7f1014e5302a4394183718c0d527549497b3</citedby><cites>FETCH-LOGICAL-c323t-4967753d25ebc43cb70f168bb2dfb7f1014e5302a4394183718c0d527549497b3</cites><orcidid>0000-0003-3940-7126 ; 0000-0002-0336-2096</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,777,781,27905,27906</link.rule.ids></links><search><creatorcontrib>Li, Bowen</creatorcontrib><creatorcontrib>Hara, Hiroyuki</creatorcontrib><creatorcontrib>Suzuki, Yuhei</creatorcontrib><creatorcontrib>Arai, Goki</creatorcontrib><creatorcontrib>Higashiguchi, Takeshi</creatorcontrib><creatorcontrib>Ohashi, Hayato</creatorcontrib><creatorcontrib>Jiang, Weihua</creatorcontrib><creatorcontrib>Makimura, Tetsuya</creatorcontrib><creatorcontrib>Sakaue, Hiroyuki A.</creatorcontrib><creatorcontrib>Suzuki, Chihiro</creatorcontrib><creatorcontrib>Kato, Daiji</creatorcontrib><creatorcontrib>Murakami, Izumi</creatorcontrib><creatorcontrib>Dunne, Padraig</creatorcontrib><creatorcontrib>Long, Elaine</creatorcontrib><creatorcontrib>Sheridan, Paul</creatorcontrib><creatorcontrib>Chen, Ximeng</creatorcontrib><creatorcontrib>O'Sullivan, Gerry</creatorcontrib><title>Properties of the extreme ultraviolet emission from germanium and gallium plasmas</title><title>Journal of applied physics</title><description>We report on the usefulness of germanium (Ge) and gallium (Ga) plasmas as potential extreme ultraviolet (EUV) sources at both 6.x and 13.5 nm, wavelengths of interest for lithography and metrology applications. Spectra from plasmas produced using neodymium-doped yttrium-aluminum-garnet (Nd:YAG) lasers with pulse durations of 170 ps and 7 ns [full width at half-maximum] and a compact electron beam ion trap have been used to determine the charge states responsible while theoretical calculations using atomic structure Cowan and HULLAC codes enabled the identification of structure in the Ge spectrum arising from strong transitions of the type 3d – 4p and 3d – 4f. Transitions of the type 3d – 4f in Ge10+ and Ga11+ were found to lie in the 6.x nm region, while 3p−3d transitions from a range of stages in both elements contribute in the 13.5 nm region. We also studied the emission spectra of galinstan plasmas, and the results imply that galinstan might provide a promising candidate for EUV applications that exploit the progress in the development of multilayer mirrors for operation at 6.x nm.</description><subject>Aluminum</subject><subject>Applied physics</subject><subject>Atomic structure</subject><subject>Electron beam lithography</subject><subject>Emission analysis</subject><subject>Emission spectra</subject><subject>Gallium</subject><subject>Germanium</subject><subject>Ions</subject><subject>Multilayers</subject><subject>Neodymium</subject><subject>Plasma</subject><subject>Plasmas (physics)</subject><subject>Ultraviolet emission</subject><subject>YAG lasers</subject><subject>Yttrium</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><recordid>eNotkE1LxDAYhIMoWFcP_oOAJw9d8-ajaY6y-AULKug5pG2ydmmamqSi_95ddk8zh4eZYRC6BrIEUrE7WHJF60qyE1QAqVUphSCnqCCEQlkrqc7RRUpbQgBqpgr0_hbDZGPubcLB4fxlsf3N0XqL5yFH89OHwWZsfZ9SH0bsYvB4Y6M3Yz97bMYOb8ww7P00mORNukRnzgzJXh11gT4fHz5Wz-X69elldb8uW0ZZLrmqpBSso8I2LWdtI4mDqm4a2rlGOiDArWCEGs4U322VULekE1QKrriSDVugm0PuFMP3bFPW2zDHcVepKVAOhFUUdtTtgWpjSClap6fYexP_NBC9f0yDPj7G_gGZl1y1</recordid><startdate>20150821</startdate><enddate>20150821</enddate><creator>Li, Bowen</creator><creator>Hara, Hiroyuki</creator><creator>Suzuki, Yuhei</creator><creator>Arai, Goki</creator><creator>Higashiguchi, Takeshi</creator><creator>Ohashi, Hayato</creator><creator>Jiang, Weihua</creator><creator>Makimura, Tetsuya</creator><creator>Sakaue, Hiroyuki A.</creator><creator>Suzuki, Chihiro</creator><creator>Kato, Daiji</creator><creator>Murakami, Izumi</creator><creator>Dunne, Padraig</creator><creator>Long, Elaine</creator><creator>Sheridan, Paul</creator><creator>Chen, Ximeng</creator><creator>O'Sullivan, Gerry</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0003-3940-7126</orcidid><orcidid>https://orcid.org/0000-0002-0336-2096</orcidid></search><sort><creationdate>20150821</creationdate><title>Properties of the extreme ultraviolet emission from germanium and gallium plasmas</title><author>Li, Bowen ; Hara, Hiroyuki ; Suzuki, Yuhei ; Arai, Goki ; Higashiguchi, Takeshi ; Ohashi, Hayato ; Jiang, Weihua ; Makimura, Tetsuya ; Sakaue, Hiroyuki A. ; Suzuki, Chihiro ; Kato, Daiji ; Murakami, Izumi ; Dunne, Padraig ; Long, Elaine ; Sheridan, Paul ; Chen, Ximeng ; O'Sullivan, Gerry</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c323t-4967753d25ebc43cb70f168bb2dfb7f1014e5302a4394183718c0d527549497b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>Aluminum</topic><topic>Applied physics</topic><topic>Atomic structure</topic><topic>Electron beam lithography</topic><topic>Emission analysis</topic><topic>Emission spectra</topic><topic>Gallium</topic><topic>Germanium</topic><topic>Ions</topic><topic>Multilayers</topic><topic>Neodymium</topic><topic>Plasma</topic><topic>Plasmas (physics)</topic><topic>Ultraviolet emission</topic><topic>YAG lasers</topic><topic>Yttrium</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Li, Bowen</creatorcontrib><creatorcontrib>Hara, Hiroyuki</creatorcontrib><creatorcontrib>Suzuki, Yuhei</creatorcontrib><creatorcontrib>Arai, Goki</creatorcontrib><creatorcontrib>Higashiguchi, Takeshi</creatorcontrib><creatorcontrib>Ohashi, Hayato</creatorcontrib><creatorcontrib>Jiang, Weihua</creatorcontrib><creatorcontrib>Makimura, Tetsuya</creatorcontrib><creatorcontrib>Sakaue, Hiroyuki A.</creatorcontrib><creatorcontrib>Suzuki, Chihiro</creatorcontrib><creatorcontrib>Kato, Daiji</creatorcontrib><creatorcontrib>Murakami, Izumi</creatorcontrib><creatorcontrib>Dunne, Padraig</creatorcontrib><creatorcontrib>Long, Elaine</creatorcontrib><creatorcontrib>Sheridan, Paul</creatorcontrib><creatorcontrib>Chen, Ximeng</creatorcontrib><creatorcontrib>O'Sullivan, Gerry</creatorcontrib><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Li, Bowen</au><au>Hara, Hiroyuki</au><au>Suzuki, Yuhei</au><au>Arai, Goki</au><au>Higashiguchi, Takeshi</au><au>Ohashi, Hayato</au><au>Jiang, Weihua</au><au>Makimura, Tetsuya</au><au>Sakaue, Hiroyuki A.</au><au>Suzuki, Chihiro</au><au>Kato, Daiji</au><au>Murakami, Izumi</au><au>Dunne, Padraig</au><au>Long, Elaine</au><au>Sheridan, Paul</au><au>Chen, Ximeng</au><au>O'Sullivan, Gerry</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Properties of the extreme ultraviolet emission from germanium and gallium plasmas</atitle><jtitle>Journal of applied physics</jtitle><date>2015-08-21</date><risdate>2015</risdate><volume>118</volume><issue>7</issue><issn>0021-8979</issn><eissn>1089-7550</eissn><abstract>We report on the usefulness of germanium (Ge) and gallium (Ga) plasmas as potential extreme ultraviolet (EUV) sources at both 6.x and 13.5 nm, wavelengths of interest for lithography and metrology applications. Spectra from plasmas produced using neodymium-doped yttrium-aluminum-garnet (Nd:YAG) lasers with pulse durations of 170 ps and 7 ns [full width at half-maximum] and a compact electron beam ion trap have been used to determine the charge states responsible while theoretical calculations using atomic structure Cowan and HULLAC codes enabled the identification of structure in the Ge spectrum arising from strong transitions of the type 3d – 4p and 3d – 4f. Transitions of the type 3d – 4f in Ge10+ and Ga11+ were found to lie in the 6.x nm region, while 3p−3d transitions from a range of stages in both elements contribute in the 13.5 nm region. We also studied the emission spectra of galinstan plasmas, and the results imply that galinstan might provide a promising candidate for EUV applications that exploit the progress in the development of multilayer mirrors for operation at 6.x nm.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/1.4928673</doi><orcidid>https://orcid.org/0000-0003-3940-7126</orcidid><orcidid>https://orcid.org/0000-0002-0336-2096</orcidid></addata></record> |
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subjects | Aluminum Applied physics Atomic structure Electron beam lithography Emission analysis Emission spectra Gallium Germanium Ions Multilayers Neodymium Plasma Plasmas (physics) Ultraviolet emission YAG lasers Yttrium |
title | Properties of the extreme ultraviolet emission from germanium and gallium plasmas |
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