Anisotropic pyrochemical microetching of poly(tetrafluoroethylene) initiated by synchrotron radiation-induced scission of molecule bonds

We developed a process for micromachining polytetrafluoroethylene (PTFE): anisotropic pyrochemical microetching induced by synchrotron X-ray irradiation. X-ray irradiation was performed at room temperature. Upon heating, the irradiated PTFE substrates exhibited high-precision features. Both the X-ra...

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Veröffentlicht in:	Applied physics letters 2016-02, Vol.108 (5)
Hauptverfasser:	Yamaguchi, Akinobu, Kido, Hideki, Ukita, Yoshiaki, Kishihara, Mitsuyoshi, Utsumi, Yuichi
Format:	Artikel
Sprache:	eng
Schlagworte:	ACCURACY ANISOTROPY Applied physics Chain scission Chemical bonds CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS Degree of polymerization Diffraction ETCHING FABRICATION Food irradiation Heating IRRADIATION Melt temperature MELTING POINTS Micromachining MICROSTRUCTURE MOLECULES POLYMERIZATION Polytetrafluoroethylene Radiation dosage RADIATION DOSES Radiation effects SIGNALS SUBSTRATES SYNCHROTRON RADIATION TEFLON TEMPERATURE RANGE 0273-0400 K X RADIATION X ray irradiation X-RAY DIFFRACTION
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