Dynamics of processes during the deposition of ZrO2 films by controlled reactive high-power impulse magnetron sputtering: A modelling study

A time-dependent parametric model was applied to controlled reactive high-power impulse magnetron sputtering (HiPIMS) depositions of stoichiometric ZrO2 films, carried out in our laboratories, (i) to clarify the complicated dynamics of the processes on the target and substrate surfaces during voltag...

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Veröffentlicht in:	Journal of applied physics 2017-07, Vol.122 (4)
Hauptverfasser:	Kozák, Tomáš, Vlček, Jaroslav
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied physics Chemisorption Deposition Inlets Magnetron sputtering Organic chemistry Oxygen atoms Partial pressure Pulse duration Substrates Surface layers Time dependence Voltage pulses Zirconium dioxide
Online-Zugang:	Volltext
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