Dielectric constant measurement using atomic force microscopy of dielectric films: a system theory approach

A technique was developed to measure dielectric constant at microscale based on the system theory approach using an atomic force microscopy (AFM), this makes possible the electrical characterization of dielectric materials using an optimized instrumentation. This technique is capable of measuring ca...

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Veröffentlicht in:	Applied physics. A, Materials science & processing Materials science & processing, 2018-10, Vol.124 (10), p.1-9, Article 667
Hauptverfasser:	Cruz-Valeriano, E., Guzmán-Caballero, D. E., Escamilla-Díaz, T., Gutierrez-Peralta, A., Davila, Susana Meraz, Torres-Ochoa, J. A., Arciniega, J. J. Gervacio, Murillo-Bracamontes, E. A., Enriquez-Flores, C. I., Ramírez-Bon, R., Palmerin, Joel Moreno, Yañez-Limón, J. M.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied physics Atomic force microscopy Capacitance Characterization and Evaluation of Materials Condensed Matter Physics Electric contacts Electric potential Electrical properties Frequency response Glass substrates Indium tin oxides Machines Manufacturing Materials science Microscopes Microscopy Nanotechnology Optical and Electronic Materials Permittivity Physics Physics and Astronomy Polymethyl methacrylate Processes Silicon dioxide Sol-gel processes Surfaces and Interfaces System theory Systems theory Thin Films Time constant Titanium dioxide Transfer functions
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