Structural and optical properties of a-C:H:O:Cl and a-C:H:Si:O:Cl films obtained by Plasma Enhanced Chemical Vapor Deposition

Amorphous hydrogenated oxygenated chlorinated carbon materials with and without silicon were produced by PECVD at deposition rates of up to 150 nm min−1. Surface roughness, morphology and contact angle were almost independent of the main system parameter, namely the partial pressure of CHCl3 in the...

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