Optimization of Post Etch Cobalt Compatible Clean by pH and Oxidizer

Optimization of Post Etch Cobalt Compatible Clean by pH and Oxidizer

The introduction of Co into MOL and BEOL requires a robust wet clean, especially the optimization of the Co rinsing step seems to be critical. The wafer rinsing solutions with a precisely controlled pH and oxidizing additive have been developed to suppress the Co corrosion. In addition, the mechanis...

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Veröffentlicht in:Solid state phenomena 2018-08, Vol.282, p.268-272
Hauptverfasser: Rip, Jens, Holsteyns, Frank, Iwasaki, Akihisa, Le, Quoc Toan, Ogawa, Yuichi, Masaoka, Toru, Oniki, Yusuke, Iino, Hideaki, Kesters, Els, Akanishi, Yuya
Format: Artikel
Sprache:eng
Schlagworte:
Cobalt
Corrosion mechanisms
Optimization
Oxidation
Passivity
Rinsing
Surface stability
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Beschreibung
Zusammenfassung:The introduction of Co into MOL and BEOL requires a robust wet clean, especially the optimization of the Co rinsing step seems to be critical. The wafer rinsing solutions with a precisely controlled pH and oxidizing additive have been developed to suppress the Co corrosion. In addition, the mechanism of passivation and corrosion of the cobalt surface as well as the passivation stability is discussed.
ISSN:1012-0394
1662-9779
1662-9779
DOI:10.4028/www.scientific.net/SSP.282.268