A Subtractive Photoresist Platform for Micro‐ and Macroscopic 3D Printed Structures
The selective removal of structural elements plays a decisive role in 3D printing applications enabling complex geometries. To date, the fabrication of complex structures on the microscale is severely limited by multistep processes. Herein, a subtractive photoresist platform technology that is trans...
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| Veröffentlicht in: | Advanced functional materials 2018-07, Vol.28 (29), p.n/a |
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| creator | Zieger, Markus M. Müller, Patrick Blasco, Eva Petit, Charlotte Hahn, Vincent Michalek, Lukas Mutlu, Hatice Wegener, Martin Barner‐Kowollik, Christopher |
| description | The selective removal of structural elements plays a decisive role in 3D printing applications enabling complex geometries. To date, the fabrication of complex structures on the microscale is severely limited by multistep processes. Herein, a subtractive photoresist platform technology that is transferable from microscopic 3D printing via direct laser writing to macroscopic structures via stereolithography is reported. All resist components are readily accessible and exchangeable, offering fast adaptation of the resist's property profile. The micro‐ and macroprinted structures can be removed in a facile fashion, without affecting objects based on standard photoresists. The cleavage is analyzed by time‐lapse optical microscopy as well as via in‐depth spectroscopic assessment. The mechanical properties of the printed materials are investigated by nanoindentation. Critically, the power of the subtractive resist platform is demonstrated by constructing complex 3D objects with flying features on the microscale.
A readily accessible and removable photoresist platform is pioneered for 3D micro‐ to macroscopic printing applications, offering fast adaptation of the resist's property profile. The micro‐ and macroprinted structures can be removed in a facile fashion, without affecting objects based on standard photoresists. |
| doi_str_mv | 10.1002/adfm.201801405 |
| format | Article |
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A readily accessible and removable photoresist platform is pioneered for 3D micro‐ to macroscopic printing applications, offering fast adaptation of the resist's property profile. 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| subjects | 3-D printers 3D printing Direct laser writing Lithography Materials science Mechanical properties microstructures Nanoindentation Optical microscopy photochemistry Photoresists polymeric materials stereolithography Structural members Three dimensional printing |
| title | A Subtractive Photoresist Platform for Micro‐ and Macroscopic 3D Printed Structures |
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