An effect of residual gas component on detected secondary ions during TOF‐SIMS depth profiling and a method to estimate contained component

With regard to Secondary Ion Mass Spectroscopy (SIMS) measurement of atmospheric gas elements, a problem occurs that the detected signal includes background components caused by residual gas along with contained components. Relating to this issue, an available method to quantify the contained compon...

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Veröffentlicht in:	Surface and interface analysis 2018-08, Vol.50 (8), p.802-806
Hauptverfasser:	Sameshima, Junichiro, Yoshikawa, Masanobu
Format:	Artikel
Sprache:	eng
Schlagworte:	background Depth profiling Ions Oxygen raster Residual gas Secondary ion mass spectroscopy Silicon substrates Sputtering time‐of‐flight secondary ion mass spectrometry
Online-Zugang:	Volltext
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