An embedded neutral layer for advanced surface affinity control in grapho-epitaxy directed self-assembly

Advanced surface affinity control for grapho-epitaxy directed self-assembly (DSA) patterning is essential for providing reliable DSA-based solutions for the development of semiconductor patterning. Independent control of surface affinity between the bottom and the sidewalls of a topographical guidin...

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Veröffentlicht in:	Nanoscale 2018-06, Vol.1 (23), p.19-191
Hauptverfasser:	Delachat, Florian, Gharbi, Ahmed, Pimenta-Barros, Patricia, Fouquet, Antoine, Claveau, Guillaume, Posseme, Nicolas, Pain, Laurent, Nicolet, Célia, Navarro, Christophe, Cayrefourcq, Ian, Tiron, Raluca
Format:	Artikel
Sprache:	eng
Schlagworte:	Affinity Embedding Epitaxy Patterning Polymers Self-assembly Surface properties Thickness
Online-Zugang:	Volltext
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