P‐59: Improving TFT Structure Uniformity in G8.5 LCDs

Methods for lessening the AS tail and N+ tail were systematically investigated in G8.5 glass for LCD product development including novel structure designs and matched 4‐Mask process. While matched 4‐Mask process had success in tails reducing, Ion keeping, stability improving and Ioff decreasing at h...

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Veröffentlicht in:	SID International Symposium Digest of technical papers 2018-05, Vol.49 (1), p.1421-1424
Hauptverfasser:	Liu, Xiao Di, Sun, Liang, Lin, Hsi Chien, Chou, Yi Fang, Chen, Shu-jhih, Li, Wen Ying, Zeng, Li Mei, Wang, Tian Hong, Xu, Hong Yuan, Lee, Chia Yu, Yi, Chiu Chung
Format:	Artikel
Sprache:	eng
Schlagworte:	4-Mask process Amorphous silicon amorphous silicon tail four-mask N+ tail Product development TFT structure design
Online-Zugang:	Volltext
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